摘要
采用直流电沉积方法,通过改变电流密度、沉积液温度、特殊添加剂C7H4NO3SNa.2H2O浓度,制备出纳米晶镍覆层材料,利用光学显微镜和高分辨透射电镜(HRTEM)对沉积覆层材料的组织形貌进行分析,通过对沉积层材料厚度的测量,研究不同条件下纳米晶镍覆层沉积速率的变化规律。结果表明:电沉积纳米晶镍覆层材料的沉积速率随着电流密度的增加而呈现增加的趋势;随着温度的增加,先增加后下降,在60℃时最大;随着特殊添加剂浓度的增加而降低。
Electrodeposited nanocrystalline nickel coatings were prepared using direct current deposition method by changing the current density, bath temperature and concentrations of the special additive C7 H4 NO3 SNa·2H2O. The microstructure was evaluated by means of optical microscope and high-resolution transmission electron microscopy （HRTEM） .The effect of technology parametes on the rate of electrodeposition was studied. The results show that the rate of electrodeposition increases discontinuously with increasing current density. The rate of electrodeposition increases firstly and then drops with increase of temperature,and the maximum rate is obtained at 60℃. The rate of deposition reduces with the increasing of the concentration of the special additive.
出处
《材料热处理学报》
EI
CAS
CSCD
北大核心
2008年第3期152-155,共4页
Transactions of Materials and Heat Treatment
关键词
纳米晶镍
沉积速率
电流密度
直流电沉积
nanocrystalline nickel
rate of deposition
current density
direct current deposition
