摘要
综述了近年来国内外磁场下电沉积研究的些进展情况,如磁场对镀液性能及镀层表面状态、微观结构、合金组成等的影响;指出磁场能控制电结晶生长方向,可以获得特定功能的镀膜。展望了该领域的发展前景及在未来研究中应解决的问题。
A review was given on the current state and development of the study on electrodeposition in the presence of magnetic field.The effects of the magnetic field on the properties of the plating bath and the morphology,microstructure,and composition of the coating were introduced.It was pointed out that the growing direction of the electroplated crystals could be readily controlled by properly adjusting the magnetic field,which was imperative for the preparation of the electroplated coating with special functions.Moreover,some prospects were suggested with respect to the relevant key problems to be solved and the future directions in the titled field.
出处
《材料保护》
CAS
CSCD
北大核心
2006年第8期38-42,共5页
Materials Protection
关键词
磁场
电沉积
镀液性能
表面状态
微观结构
合金组成
magnetic field
electroplating
properties of plating bath
morphology
microstructure
composition
research progress
