摘要
用浸泡法和电化学法研究了纯钛(TA2)基体材料及其离子氮化层在人工唾液中的腐蚀行为。浸泡法研究表明,试样随着浸泡时间的延长而增重,而离子氮化层增重明显减缓,其腐蚀速率远小于TA2基材;电化学法研究表明,离子氮化层的自腐蚀电位较TA2基材提高,而腐蚀电流密度和腐蚀速度减小。由失重法和电化学法得出一致结论,离子氮化处理提高了TA2在人工唾液中的耐蚀性。
The corrosion behavior of plasma nitriding layer and substrate on pure titanium （TA2） in artificial saliva solution were investigated by immersion test and electrochemical technigue respectively. The results of immersion test show that the weight gain of the specimens increases with prolonging immersing time, while the trend of weight gain of plasma nitriding layer retarded obviously and its corrosion rate is far lower than that of TA2 substrate. Electrochemical measurement results also indicate that compared to TA2 substrate, plasma nitriding layer has higher free corrosion potential, lower corrosion current and corrosion rate. From immersion test and electrochemical experiments, it can come to the conclusion that plasma nitriding improved the corrosion resistance of TA2 in artificial saliva solution.
出处
《稀有金属快报》
CAS
CSCD
2008年第5期22-26,共5页
Rare Metals Letters
基金
国家自然科学基金资助(50501016)
关键词
纯钛
离子氮化
人工唾液
耐蚀性
pure titanium
plasma nitriding
artificial saliva
corrosion resistance
