摘要
针对IC晶片导线特征检测中的难点,介绍一种基于图像处理技术的导线特征分析和缺陷检测方法,把由局部缺陷引起的线路短路、开路故障分析归结为多条平行线宽和线距的分析,先通过Hough变换实现导线边缘的直线拟合和线宽、线距的亚像素测量,再根据测量结果建立起导线边缘标准模型,并把边缘图像的二维信号转换为一维信号进行分析,最终实现导线特征的分析和缺陷的定位;仿真和实际运用结果表明该方法使IC晶片导线特征分析简单化,并使缺陷分析定位变得更加方便灵活。
A method of inspection for IC wafer circuit character is presented in this article, putting forward a point that taking on the analysis to the width of multi-parallels and the distance between them as the analysis to the circuit failure caused by local defection. The Hough transform is applied in line fitting, width and distance measurement, then building a standard model of circuit＇s edge, so as to realize the analysis to the feature of wire and defect position. Simulation and experimental results show that the proper method gives a simple analysis method of IC circuit character, and more convenience for IC defect analysis and Location.
出处
《计算机测量与控制》
CSCD
2008年第4期470-472,共3页
Computer Measurement &Control
