摘要
近年来,国内外SiC薄膜材料制备工艺研究迅速发展,由此带来SiC薄膜性能方面的研究也获得长足的进步,新技术、新工艺、新性能不断涌现。溅射SiC技术相对于其它沉积技术(CVD、PIP等)有许多独特的优点:沉积温度低、结合性和致密性好、表面平整、硬度高、光电性能优异以及工艺安全环保等,因此越来越受到重视,且已经成为沉积高性能SiC薄膜的重要技术方法。主要论述了几种不同溅射技术,着重介绍了溅射技术在SiC薄膜制备中的研究进展及SiC薄膜性能方面的研究进展和应用,并且展望了溅射技术制备SiC薄膜的发展前景和当前热点研究领域。
In recent years, the deposited technologies of SiC coatings have made great progress, which makes great development for the study of the property of SiC coatings, the new technology and the new property emerge continually. Comparing with the other technologies（ CVD and PIP ） , the sputtering technology has many profits： the low deposited temperature, high adhesive strength and compaction, smooth surface, enhanced hardness, enhanced optics and electries characteristic and soft-environmental, so it has been focused on depositing the SiC coatings more and more. The theory and deposited technology about several sputtering technologies were discussed; the sputtering-technologic progress, characteristic and application of SiC coatings were emphasized ; and the developing foreground and the hotspots about the sputtering SiC coating were expected.
出处
《表面技术》
CAS
CSCD
2008年第2期75-78,共4页
Surface Technology
基金
湛江师范学院重点科研项目(L0507)
