摘要
通过改变溅射功率以磁控溅射法制备了Cu/Cr合金催化剂,研究了化学气相沉积法制备的碳纳米管(CNTs)作为大电流密度场发射阴极的场发射性能。采用扫描电镜和场发射测试仪分别对不同功率催化剂制备的CNTs进行了形貌及性能分析。结果表明,根据溅射功率与催化剂颗粒的关系,可以通过调节溅射功率改变CNTs的长径比及密度,在250WCu/Cr催化剂制备的CNTs薄膜具备了良好的场发射性能,阴极电子发射的开启电场仅为1.47V/μm,当电场为3.23V/μm,发射电流密度可高达3259μA/cm2。
Catalyst is the most important factor in fabricating CNTs by CVD.In this paper,the power of CuCr alloy catalyst by magnetron sputtering method which have effects on the diameter,density,character of CNTs is studied.Based on the theory of grain growth in thin films,the observation by scan electron microscope and I-V characters,it＇s suggested the adjustment of diameters and densities is possible by changing the power of sputtering on fabrication of CuCr alloy catalyst.The carbon nanotubes with good field emission is obtained.When the power is 250 W,the turn-on field of the CNTs cathode is 1.47 V/μm,and the average current density arrives at 3 259 μA/cm^2 at the applied field 3.23 V/μm.
出处
《液晶与显示》
CAS
CSCD
北大核心
2007年第6期708-713,共6页
Chinese Journal of Liquid Crystals and Displays
基金
上海市科委科技攻关项目(No.06DZ11404)
上海市纳米专项(No.0652nm033)
国家自然科学基金(No.50672026)
上海市经委平板显示人才开发项目
关键词
碳纳米管
CuCr催化剂
大电流密度
carbon nanotubes
CuCr alloy catalyst
large current density
