摘要
采用RF磁控溅射方法,在玻璃衬底上制备了择优取向的ZnO薄膜;通过台阶仪、X射线衍射技术、原子力显微镜和分光光度计分别测量了不同溅射功率条件下淀积的ZnO薄膜厚度(淀积速率)、结晶质量、表面形貌与粗糙度、透光光谱,报道了该薄膜结晶质量、薄膜粗糙度与其在可见光区透光率的关系。
ZnO films which have preferred orientation were deposited on glass substrate by RF magnetron sputtering. The thickness （deposition rate） , crystal quality, morphology and roughness, transmittance spectrum of ZnO films at different sputtering powers were measured by Stylus Profiler, XRD, AFM and spectrophotometer. The relationship among crystal quality, roughness and transmittance in the visible wavelength region was reported.
出处
《南昌大学学报（理科版）》
CAS
北大核心
2007年第5期452-455,共4页
Journal of Nanchang University(Natural Science)
关键词
ZNO
磁控溅射
透光光谱
粗糙度
溅射功率
ZnO
magnetron sputtering
transmittance spectrum
roughness
sputtering power
