摘要
采用正交实验筛选出一种含11.0mass%P自腐蚀电位为-0.35V的Ni-P、合金镀层作为中间层,与含9.7mass%P、自腐蚀电位为-0.46V的Ni-P合金镀层作为表面层,复配成为双镀层.采用PdCl2稳定性实验检验了镀液的稳定性,用中性盐雾试验、孔隙率试验和扫描电镜对比研究了双层化学镀Ni-P与单层化学镀Ni-P的腐蚀速率和耐点蚀特性.实验结果显示:双层镀Ni-P试样的平均腐蚀速率为7.04μm/a,仅为单层镀试样腐蚀速率28.3μm/a的四分之一,表明双层化学镀Ni-P耐孔蚀性能明显优于单层化学镀Ni-P.
Double layered Ni-P electroless deposits consised of two layers with different P content. The open circle potential in 3.5% NaC1 solution of the inner deposit with 11.0 mass% P is -0.35 V. And that of the top deposit with 9.7 mass% is - 0.46V. PdC12 solution was used to evaluate the stability of the Ni-P electroless plating solutions. The anticorrosion property of the double layered electroless deposit and that of the single deposit were compared by the standard salt spray test, and the pit corrosion resist- ances of the two kinds of deposits were evaluated by filter paper method and scaning electron microscope. The experimental results show that the corrosion rate of the double layered electroless deposit sample （7.04μm/a） is much lower than that of single electroless deposit sample （28.3μm/a）. The double layered electroless deposit has higher uniform corrosion resistance and pit corrosion resistance than that of the single Ni-P electroless deposit.
出处
《腐蚀科学与防护技术》
CAS
CSCD
北大核心
2007年第6期435-438,共4页
Corrosion Science and Protection Technology
关键词
化学镀NI-P合金
双层镀
孔蚀
electroless Ni-P alloy
double layered deposits
pit corrosion resistance
