期刊文献+

工件电位对奥氏体不锈钢活性屏离子渗氮的影响 被引量:6

Effect of Component′s Potential on Active Screen Plasma Nitriding of Austenitic Stainless Steel
在线阅读 下载PDF
导出
摘要 用活性屏离子渗氮技术分别对处于悬浮电位和阳极电位的AISI316L奥氏体不锈钢进行低温渗氮处理。并对渗氮层的组织、形貌、相结构、显微硬度和耐蚀性能进行分析。结果表明,在这两种电位状态下处理的试样均可获得具有S相结构特征的单相硬化层。渗氮层不仅具有高的硬度,还有良好的耐蚀性能。在活性屏离子渗氮过程中,从活性屏上溅射下来的中性S相粒子也可以起到氮载体的作用。活性屏空间中性粒子和电子的撞击足以消除不锈钢表面钝化膜对氮的阻隔作用。 AISI 316L austenitic stainless steel was nitirded in floating potential and anodic (zero) potential at low temperature by active screen plasma nitriding (ASPN).The microstructures,surface morphologies,phase structures,microhardness and corrosion resistance of the nitrided layers were tested and analyzed.The experimental results show that ASP nitriding under both of these electric potentials can produce a hardened layer on the samples with single S phase structure which exhibits not only high mircorhardness but also good corrosion resistance.The neutral particles sputtered from the active screen play an important role of nitrogen mass transfer in the AS plasma nitriding.The bombardment of neutral particles and electrons in the active screen space can remove the passivated film hindering the nitrogen penetration.
出处 《金属热处理》 EI CAS CSCD 北大核心 2007年第11期42-45,共4页 Heat Treatment of Metals
关键词 奥氏体不锈钢 活性屏离子渗氮 悬浮电位 阳极电位 austentic stainless steel active screen plasma nitriding (ASPN) floating potential anodic (zero) potential
  • 相关文献

参考文献4

  • 1云红.不锈钢气体氮化的难点及其解决方法[J].机械研究与应用,2003,16(B08):65-65. 被引量:11
  • 2Zhang Z L,Bell T.Structure and corrosion resistance of plasma nitrided stainless steel[J].Surface Engineering,1985,1 (2):131-134.
  • 3Zhao Cheng,Li CX,Dong H,Bell T.Study on the active screen plasma nitriding and its nitriding mechanism[J],Surface and Coatings Technology,2006,201(6):2320-2325.
  • 4Li C X,Georges J,Li X Y.Active screen plasma nitriding of austenitic stainless steel[J].Surface Engineering,2002,18(6):453-458.

二级参考文献1

  • 1安运铮.热处理工艺学[M].北京:机械工业出版社,1982..

共引文献10

同被引文献41

  • 1赵程.AISI316奥氏体不锈钢低温PC、PN和PC+PN表面硬化处理[J].青岛科技大学学报(自然科学版),2004,25(4):328-331. 被引量:14
  • 2T.BELL,LiXY,SunY,刘家浚,张秋英.对于提高奥氏体不锈钢离子氮化表面腐蚀性能的措施[J].中国表面工程,1998,11(4):40-48. 被引量:13
  • 3龙发进,周祎,康光宇,李鑫鸿,耿漫.离子渗氮新技术的研究现状[J].热加工工艺,2007,36(6):61-64. 被引量:20
  • 4徐重等.离子氮化装置中的双层辉光放电现象及其放电特性的研究[J].太原工业学院学报,1981,(1):76-76.
  • 5Georges J. TC Plasma Nitriding, Proceedings of the 12th International Federation of Heat Treatment and Surface Engineering Congress [ C ]//Melbourne : [ s. n ] ,2000:229-235.
  • 6Li C. X. and T. Bell, Principles. Mechanisms and Applications of Active Screen Plasma Nitriding [ J ]. Heat Treatment of Metals, 2003, 1: 1-7.
  • 7C. Zhao, C. X. Li, H. Dong, et al. Study on the Active Screen Plasma Nitriding and Its Nitriding Mechanism [ J ]. Surface & Coating Technology, 2006, 201:2320-2325.
  • 8李孔军,刘锦云,金应荣,等.纯氮气氛下铜制活性屏离子渗氮的研究.
  • 9C. X.. Li, T. Bell and H. Dong. A Study of Active Screen Plasma Nitriding [J]. Surface Engineering, 2002, 18 (3) :173-181.
  • 10徐冰仲 张颖智.离子氮化氮的渗入机理.金属热处理,1983,(10):29-29.

引证文献6

二级引证文献40

相关作者

内容加载中请稍等...

相关机构

内容加载中请稍等...

相关主题

内容加载中请稍等...

浏览历史

内容加载中请稍等...
;
使用帮助 返回顶部