摘要
用原子力显微镜测量了气体离化团束照射后表面粗糙度的变化。已经证实气体团束轰击对表面沾污具有很高的清除率，同时却引起较低的损伤。气体离化团束优良的平坦化和清洁化效果可能与照射中多体碰撞、侧向溅射及高能量密度的沉积相关。
Changes in surface roughness after gas cluster ion bombardments have been measured by an atomic force microscope. A high removal rate of surface impurities by ion cluster bombardment has been confirmed in connection with low damage effects. The unique smoothing and cleaning effects of gas cluster ion beam wou1d result from multiple collision,lateral sputtering and high density energy deposition.
出处
《真空科学与技术》
CSCD
北大核心
1997年第4期252-258,共7页
Vacuum Science and Technology
关键词
气体离化团束
溅射
表面平坦化
表面清洁化
Atomic force microscope, Surface roughness, Sputtering, Surface smoothing, Surface cleaning
