摘要
研究了CO2，Ar离化团束对不同金属系统及SiO2表面的溅射效应。离化团束的溅射产额比之单体离子束高100倍以上。气体离化团束的高溅射产额可能是由于多体碰撞、侧向溅射及高能量密度的照射引起的。
The sputtering effects on metals and SiO2 surface irradiated with CO2,Ar cluster ion beams have been studied. The sputtering yield per cluster ion is higher than that for monomer ion by a factor of more than 100. The higher sputtering yield would result from multiple collision,lateral sputtering and high density energy deposition of gas cluster ion beam.
出处
《真空科学与技术》
CSCD
北大核心
1997年第3期175-182,共8页
Vacuum Science and Technology
关键词
团束
溅射产额
剂量
侧向溅射
气体离化
Cluster,Sputtering yield,Dose, Lateral sputtering,Angular distribution
