摘要
本文利用微波电子回旋共振(ECR)等离子体化学气相沉积(CVD)法在较低气压下进行了金刚膜的沉积工艺研究,发现CH_4气体的浓度可适当提高至CH_4/H_2=0.8。所得的Raman谱图证实在该条件下得到的膜比在CH_4/H_2较小情况下得到的膜含有更多的金刚石相。
The deposition of diamond film has been studied by the microwave ECR chemical vapor deposition method at low pressure. We found that the methane concentration could be extented to as high as CH4/H2 = 0. 8. The Raman spectra proved that film included more diamond phase than those deposited at lower methane concentration, and an explanation was given for this point.
出处
《苏州大学学报（自然科学版）》
CAS
1997年第1期27-29,共3页
Journal of Soochow University(Natural Science Edition)
