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等离子体法制备类金刚石膜的研究 被引量:1

Research on Preparating Diamond like Film by Plasma
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摘要 等离子体法制备超微材料是比较理想的方法之一,采用等离子体法制备类金刚石膜,近年来有了很大的进展,通过比较可知:等离子体法可以在低温下进行化学合成反应,实现了低温化学气相反应过程;反应转率高能充分利用反应物源;不需要其它助剂可以合成高纯度高密度、薄膜粒度可控制在纳米级到亚微米级的材料;可以进行亚稳态物质和新材料的合成。 As a kind of ultramaterial, diamond like film withthe characteristic of diamond has been applied extensively. The preparation of diamond like film by plasma is one of the ideal ways to do it,and it has been progressing rapidly recently. We can make a conclusion by comparision that it can proceed a chemical synthetic reaction by plasma,thereby, achieve the low temperature chemical vapor deposition. The advantage of plasma is that it can achieve with high reaction rate,apply the reaction source to the full, composit with high purity and density without any assistant agent,the film granularity can be controlled to nanometre or submicron and synthesize metastable state matter with new material.
作者 周亚光
机构地区 哈尔滨师范大学
出处 《材料科学与工艺》 EI CAS CSCD 1997年第1期36-40,共5页 Materials Science and Technology
关键词 等离子体法 超微材料 类金刚石膜 薄膜 DLD Diamond like film Ultramaterial PCVD
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  • 1郭力军,许念坎,刘正堂,张贵锋,郑修麟.极板负偏压对类金刚石薄膜性质的影响[J].材料研究学报,1994,8(1):67-70. 被引量:6
  • 2F. Allaire,L. Parent,S. Dallaire. Production of submicron SiC particles by d.c. thermal plasma: a systematic approach based on injection parameters[J] 1991,Journal of Materials Science(15):4160~4165
  • 3Yasufumi Nariki,Yasunobu Inoue,Kohichi Tanaka. Production of ultra fine SiC powder from SiC bulk by arc-plasma irradiation under different atmospheres and its application to photocatalysts[J] 1990,Journal of Materials Science(7):3101~3104
  • 4K. Kijima,H. Noguchi,M. Konishi. Sintering of ultrafine SiC powders prepared by plasma CVD[J] 1989,Journal of Materials Science(8):2929~2933

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