期刊文献+

微量掺碳nc-SiC:H薄膜用于p-i-n太阳电池的窗口层 被引量:3

Deposition of p-type nc-SiC:H thin films with subtle carbon incorporation for applications in p-i-n solar cells
原文传递
导出
摘要 采用等离子增强化学气相沉积方法(PECVD)制备了微量掺碳的p型纳米非晶硅碳薄膜(p-nc-SiC:H),反应气体为硅烷和甲烷,掺杂气体采用硼烷,沉积温度分别采用333K,353K和373K.测量结果表明随着沉积温度增加和碳含量的增加,薄膜的光学带隙增加;薄膜具有较宽的带隙和较高的电导率,同时有较低的激活能(0.06eV).Raman和XRD测量结果表明薄膜存在纳米晶.优化的p型纳米非晶硅碳薄膜作为非晶硅p-i-n太阳电池的窗口层,使得太阳电池的开路电压达到0.94V. This paper presents a detailed study on the effects of carbon incorporation and substrate temperature on structural, optical, and electrical properties of p-type nanocrystalline amorphous silicon films. A p-nc-SiC : H thin film with optical gap of 1.92 eV and activation energy of 0.06 eV is obtained through optimizing the plasma parameters. By using this p-type window layer, single junction diphasic nc-SiC:H/a-Si:H solar cells have been successfully prepared with a Voc of 0.94 eV.
出处 《物理学报》 SCIE EI CAS CSCD 北大核心 2007年第5期2915-2919,共5页 Acta Physica Sinica
基金 北京市自然科学基金(批准号:04D063)资助的课题~~
关键词 光学带隙 纳米硅 薄膜 太阳能电池 Infrared absorption spectra, optical band gap, nanocrystalline silicon films, solar cells
  • 相关文献

参考文献8

  • 1Tawada Y,Okamoto H,Hamakawa Y 1981 Appl.Phys.Lett.39 237
  • 2Hattori Y,Kruangam D,Katoh K,Nitta Y,Okomoto H,Hamakawa Y 1987 Tech.Dig.Int.PVSEC-3 171
  • 3Ma M,Aoyama S,Okamoto H,Hamakawa Y 1996 Solar Energy Materials and Solar Cells 41/42 453
  • 4Liao X B,Hu Z H,Diao H W,Cai Y,Zhang S B,Fortunato E,Martins R 2006 J.Non-Cryst.Solids in press.
  • 5郝会颖,孔光临,曾湘波,许颖,刁宏伟,廖显伯.非晶/微晶相变域硅薄膜及其太阳能电池[J].物理学报,2005,54(7):3327-3331. 被引量:16
  • 6Zi J,Buscher H,Faller C,Ludwing W,Zhang K,Xie X 1996 Appl.Phys.Lett.69 200
  • 7Chen Z M,Wang J N,Mei X Y,Kong G L 1986 Solid State Commun.58 379
  • 8徐艳月.2003.博士论文.中国科学院

二级参考文献12

  • 1Lstaebler D and Wronski C R 1977 Appl. Phys. Lett. 31 292.
  • 2Roca P, Cabarrocas I, Fontcuberta A, Morral I and Poissant Y 2002Thin Solid Filims 39 403.
  • 3Voylesa P M 2001 J. Appl. Phys. 90 4437.
  • 4Pearce J M, Koval R J, Ferlauto A S, Collins R W and Wronski C R 2000 Appl. Phys. Lett. 77 3093.
  • 5Das C and Ray S 2002 Thin Solid Films 81 403.
  • 6Sheng S, Liao X and Kong G 1998 Appl. Phys. Lett. 73 336.
  • 7Zhang S, Liao X, Wang Y, Diao H, Xu Y, Hu Z, Zeng X and Kong G 2002 29th IEEE PVSC 2198.
  • 8Veprk S, Sarott F A and Iqbal Z 1987 Phys. Rev. B 36 3344.
  • 9Zi J, Buscher H, Faller C, Ludwing W, Zhang K and Xie X 1996 Appl. Phys. Lett. 69 200.
  • 10Lord K, Yan B, Yang J and Guha S 2001 Appl. Phys. Lett. 79 3800.

共引文献15

同被引文献28

  • 1LASSAUT J.Fabrication and its characteristics of low-temperature polycrystalline silicon thin films[J].Science China(Technological Sciences),2009,52(1):260-263. 被引量:5
  • 2胡志华,廖显伯,刁宏伟,夏朝凤,曾湘波,郝会颖,孔光临.p型纳米硅与a-Si∶H不锈钢底衬nip太阳电池[J].物理学报,2005,54(6):2945-2949. 被引量:8
  • 3王欣,于晓梅,田大宇.SiN_x和SiC材料的红外吸收特性研究[J].传感技术学报,2006,19(05A):1778-1780. 被引量:2
  • 4汪昌州,杨仕娥,陈永生,杨根,郜小勇,卢景霄.硼掺杂对μc-Si:H薄膜微结构和光电性能的影响[J].人工晶体学报,2007,36(1):123-128. 被引量:6
  • 5Sawada T,Terada N, Tsuge S, et a1.High-efficiency a-Si/c-Si heterojunction solar cell[C]//Proc. of the First WCPEC Conference,Hawaii, 1994:1219-1226.
  • 6Deng Qingwen,Wang Xiaoliang,Xiao Hongling,et al.Theoretical investigation of efficiency of a p-a-SiC∶H/i-a-Si∶H/n-μc-Si solar cell[J]. J. of Semiconductors,2010,31(10):103003-1-5.
  • 7何宇亮,李正平, 沈文忠.纳米硅薄膜的特殊性能及其应用前景[C]//第十一届中国光伏大会暨展览会会议论文集,南京,2010,11:708-712.
  • 8AFORS-HET:numerical simulation of solar cells and measurements[BL/ON]. http://www.helmholtz-berlin.de/forschung/enma/si-pv/projekte/asicsi/afors-het/index_en.html.
  • 9Shah A, Meier J, Vallat-Sauvain E, et al. Microcrystal- line silicon and ' micromorph' tandem solar cells [ J ]. Thin Solid Films, 2002, 403-404 : 179-183.
  • 10Nasuno Y, Kondo M, Matsuda A. Microcrystalline silicon thin-film solar ceils prepared at low temperature using PECVD [ J ]. Solar Energy Materials and Solar Cells, 2002, 74 (1-4) : 497-503.

引证文献3

二级引证文献2

相关作者

内容加载中请稍等...

相关机构

内容加载中请稍等...

相关主题

内容加载中请稍等...

浏览历史

内容加载中请稍等...
;
使用帮助 返回顶部