摘要
在摩擦学研究的基础上，综合评述与探讨了物理气相沉积薄膜摩擦和磨损的机械－化学作用机理；根据这种机理分析讨论了对物理气相沉积润滑和耐磨薄膜的基本要求；
A mechanical chemical mechanism of friction and wear was primarily studied based on the fundamental results from tribology research;Some essential requirements for physical vapour deposited(PVD) lubricating and wear resistant thin solid films were discussed depending on this mechanism; Basic technology for PVD to reach these requirements was discussed.
出处
《摩擦学学报》
EI
CAS
CSCD
北大核心
1996年第3期282-288,共7页
Tribology
基金
国家自然科学基金
关键词
物理气相沉积
薄膜润滑
耐磨薄膜
physical vapour deposition thin film lubricating antifriction wear resistance mechanical chemical mechanism
