摘要
以硅烷偶联剂对原位生成nmSiO2进行表面处理,通过分散聚合工艺制得聚苯乙烯接枝包覆nmSiO2(nmSiO2-g-PSt).通过TEM,TGA和FTIR等对上述纳米氧化硅样品进行了表征,并就处理温度、时间、分散剂用量和搅拌速度的影响进行了讨论.结果表明:常温下在无水乙醇介质中处理48 h以上可获得良好的硅烷处理效果;PSt已接枝包覆于nmSiO2表面,接枝率约40%;经甲苯洗涤前nmSiO2-g-PSt呈多粒子包覆微球状,洗涤后呈单粒子包覆网状结构;分散剂用量、搅拌速度改变对接枝率有影响,但对包覆形态影响不大.
NmSiO2-polystyrene core-shell microsphere （nmSiO2-g-PSt） was prepared by a dispersion polymerization in which nmSiO2 grafted with couple agent KH570 （nmSiO2-g-KH570） was employed as seeds. The modified nmSiO2 was analyzed by TEM, TGA, FTIR respectively and the influence of treatment time, temperature, contents of dispersion agents and agitation speed were discussed. It is shown that polystyrene（PSt） has been grafted on the surface of nmSiO2 particles and the grafting ratio is about 40%. The surface of nmSiO2 could be treated effectively by KH570in absolute ethanol at 25℃,48h. The nmSiO2-g-PSt unpurified by toluene appear microsphere in which nmSiO2 particles are contained, whereas the purified one appear internet formed by many pieces. The grafting ratio of PSt on nmSiO2 surface could be influenced obviously by dispersion agents content and agitation speed, whereas the morphology of nmSiO2-g-PSt purified is rarely changed.
出处
《浙江工业大学学报》
CAS
2007年第2期178-181,共4页
Journal of Zhejiang University of Technology
基金
浙江省教育厅项目(20040506)
杭州市科技局项目(20052431B09)
