摘要
本文介绍了一台利用磁控溅射产生金属团簇,同时蒸发绝缘介质得到金属颗粒-绝缘体包埋团簇的设备,并利用该设备成功地制备出了Cu:CaF2和Ti:CaF2等金属颗粒膜。该设备适应性广,可产生几乎所有固体金属和半导体团簇。从而可以得到众多组合的功能膜。包埋在绝缘体中的团簇大小在10nm-70nm之间,为多晶结构;
A machine,using magnetic controll sputtering atom and evaporating insulator medium,is introduced.With this machine,several kinds of nano grain metal insulator films,such as Cu:CaF 2 and Ti:CaF 2 films,have been successfully prepared.This machine is suitable for almost all kinds of solid metal and semiconductor clusters.And with it,many kinds of function film series can be prepared.The size of cluster embedded in insulator is from 10nm to 70nm.The Cu cluster and CaF 2 medium are both polycrystalline structures.
出处
《功能材料》
EI
CAS
CSCD
1996年第6期534-535,共2页
Journal of Functional Materials
基金
国家自然科学基金
优秀青年教师基金