摘要
引进的俄罗斯TM-1201溅射台,经过在生产过程中结合现状不断革新改进、工艺技术上精雕细啄,从而使该设备长期保持良好的运行状态。薄膜的质量、膜厚均匀性也得到显著提高,并能满足1000MHz器件(铝条间隔0．58μm)对镀膜提出的质量要求。
The metal sputtering equipment TM-1201, imported from Russia, has been continuously modified and improved, and the sputtering process has been elaborately optimized, so as to maintain the equipment in good oprating conditions. The film quality and thickness uniformity have been improved significantly to meet the requirements of 1GHz devices with the aluminum line space at 0.58 micron.
出处
《电子与封装》
2006年第11期35-37,共3页
Electronics & Packaging
关键词
溅射台
薄膜
均匀性
冷凝泵
sputtering equipment
thin film
uniformity
cryopump
