摘要
纳米光纤探针是扫描近场光学显微镜的常用关键器件,化学腐蚀法制备近场光学光纤探针是基于腐蚀液弯液面的高度随光纤芯径的动态变化过程。从流体力学杨-拉普拉斯方程出发,研究了弯液面高度随光纤芯径大小的变化关系,分析了影响腐蚀法制备纳米光纤探针的相关因素,追踪了利用化学腐蚀制备纳米光纤探针的最新进展,介绍了静态腐蚀法、动态腐蚀法和选择腐蚀法等多种方法,并分析了每种方法的特点,作了比较和总结。
Optical fiber nano-probe is usually the key component of the near-field optical microscope. The principle of fabrication of near-field optical fiber probe by chemical etching is based on the dynamic characteristics of etching meniscus associated with alteration of the fiber diameter. According to derivation from Young-Laplace equation of hydromechanics, the relationship between the height of meniscus and fiber diameter was described. Other related parameters that influencing the etching result of optical fiber nano-probes were discussed. Various etching methods, such as static chemical etching, dynamic chemical etching and selective chemical etching were described respectively. Furthermore, the characteristics of each method were analyzed and compared.
出处
《电子显微学报》
CAS
CSCD
2006年第5期450-454,共5页
Journal of Chinese Electron Microscopy Society
基金
国家自然科学基金资助项目(No.30270367)
高等学校博士学科点专项科研基金资助(No.20020141018)~~
关键词
化学腐蚀法
扫描近场光学显微镜
光纤探针
弯液面
chemical etching
scanning near-field optical microscope
optical fiber probe
meniscus
