摘要
透明导电薄膜作为一种新型的光电材料显示出多种优异的光电性能和具有广泛的应用背景。综述了金属基复合透明导电膜的发展历程与研究现状,重点讨论了电介质/金属/电介质(D/M/D)和透明导电氧化物/金属/透明导电氧化物(TCO/M/TCO)这两种类型的多层复合膜,分析了其设计原理和存在问题,并指出了控制金属层的厚度和界面扩散是制备高性能光电薄膜的重要方面,最后介绍了金属基复合膜应用,并对其研究进行了展望。
Transparent conducting film shows various excellent optical and electrical properties and abroad applied background as a new kind of photoelectrical materials. Its tendency of development and research situation were recited and two types of muhilayer films which were dielectric/metal/dielectric （ D/M/D ） and transparent conducting oxide/metal/transparent conducting oxide （TCO/M/TCO） were mainly discussed.The principle of design and existing problems were analyzed, and it was considered that there were two important aspects of fabricating excellent photoelectrical thin film which were controlling the thickness of metal and diffusing of interface. Moreover, the application of multilayer films was presented and the foreground of development was viewed.
出处
《稀有金属》
EI
CAS
CSCD
北大核心
2006年第4期505-510,共6页
Chinese Journal of Rare Metals
基金
华中科技大学优秀博士论文基金[2004]39号资助项目
关键词
薄膜
透明导电氧化物
电介质
金属基复合
设计原理
thin film
transparent conducting oxide
dielectric
metal-based compound
design theory
