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等离子体中生成薄膜及其强度 被引量:2

Thin Films Processed in Plasma and the Mechanical Evalustions
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摘要 在表面工程中以等离子体辅助形成的薄膜材料,自90年代以来成为材料研究中的热点,在机械工业中的使用范围也越益广泛。以往我们用材料强度来评价整体材料的质量,指导其发展。薄膜材料的性能不仅取决于其组成还和形成工艺及参数有密切关系,因而更需要建立薄膜及表面的力学性能评价方法和判据。本文介绍等离子体中生成薄膜的主要工艺及薄膜力学性能测试的特点。 Thin films'processed in the environment assisted by plasma have been highlighted since the ninetieth. Plasma enhanced surface engineering has been employed broadly in mechanical industry.We are familiar with material strength for the evaluation of bulk materials as well as for their developments.The properties of thin films not only depend on the constitutions but on the processing parameters,thus it,s more important to establish the ways of evaluation and criteria.Thin paper introduces some main processes and the special points of mechanical evaluations of thin films.
作者 何家文
机构地区 西安交通大学
出处 《机械工程材料》 CAS CSCD 1996年第2期1-3,共3页 Materials For Mechanical Engineering
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参考文献2

  • 1侯根良,硕士学位论文,1995年
  • 2Cheng H S,1990年

同被引文献14

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