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标准CMOS工艺下Si光电探测器的模拟与设计 被引量:1

Simulation and Design of Si-photodetector in Standard CMOS Process
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摘要 设计了与标准CMOS工艺兼容的硅双光电探测器,并从理论上计算和分析了其绝对光谱响应。0.5pmCMOS工艺条件数值模拟结果显示,在无抗反射膜情况下该探测器在400~900nm波长范围内响应度都在0.2A/W以上,尤其是在短波长处效果比一般的探测器要好。还就反向偏压以及CMOS工艺中介质与钝化层等因素对探测器响应度的影响进行了讨论。 A CMOS-process-compatible silicon double photodetector is designed. And the theoretical absolute spectral response of this photodetector is calculated and analyzed. The spectral responsivity in 0. 5 μm CMOS process is simulated. Simulation results show better spectral responsivities especially in the short wavelength range. The responsivity is above 0.2 A/ W within the wavelength range from 400 nm to 900 nm without anti-reflection-coating. The responsivity dependent on the insulated medium and passivation layers in CMOS process and reverse bias is also discussed.
作者 卞剑涛 陈朝
机构地区 厦门大学物理系
出处 《半导体光电》 EI CAS CSCD 北大核心 2006年第2期128-132,共5页 Semiconductor Optoelectronics
关键词 CMOS 光电探测器 CMOS photodetector silicon
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