摘要
采用射频等离子体化学气相沉积设备,以CF4为反应气体,进行了无水胶印版材斥墨层制备的实验。研究了不同等离子体参数(功率、气压和时间)对聚合薄膜性能的影响,并通过接触角、红外光谱、扫描电子显微镜对薄膜表面结构和性能的表征,对等离子体工艺进行优化,得到了表面疏水性能良好的低表面能薄膜。推墨实验结果表明,所聚合的薄膜基本达到斥墨层的要求,用含氟等离子体技术制备无水胶印版材斥墨层的技术路线是可行的。
Using CF4 as feeding gas, ink-repulsive layer of waterless offset plate was deposited by RF-PCVD equipment. The effects of plasma parameters such as input power, pressure and duration time on polymerized films were investigated. The characterization of the films were measured by water contact angle（WCA）, Fourier transform infrared （FTIR） and Scanning Electron Microscopy （SEM）. Low surface energy film was deposited with excellent hydrophobic properties and the result shows that it is reasonable to deposit ink-repulsive layer by CF4 plasma technology.
出处
《北京印刷学院学报》
2006年第1期18-20,共3页
Journal of Beijing Institute of Graphic Communication
关键词
CF4等离子体
接枝
斥墨层
无水胶印版
CF4 plasmas
Grafting
Ink-repulsive layer
waterless offset plate
