摘要
采用CVD(chemical Vapor Deposition)法沉积的钨涂层有[100]／[111]／[110]择优取向。择优取向主要受气体组分、流动速度、温度等因素的影响。研究了钼基体上CVD钨涂层的表面形貌和织构、涂层界面的元素分布、涂层的抗热震性能及高温扩散性能。结果显示：钨涂层与基体钼有2μm左右的互扩散层且钼在钨中的扩散速度更高；涂层在通H_2条件下,进行室温→1400℃→室温20次循环后涂层不脱落、界面没有明显变化,涂层结合力好：涂层界面上的杂质元素氧等影响涂层的结合性能。
The deposition of tungsten layers with [100]/[111]/[110] preferential orientations was made by CVD-chloride-method. The produced orientation depended on gas composition, rate of gas flow, temperature etc. Morphology, section texture, thermal shock and diffusion characterization at high temperature for the coatings were studied. The result of the high temperature diffusion experiment shows that the diffusion rate from molybdenum substrate to tungsten coatings is faster than that from the coatings to the substrate, and the tungsten diffusion layer with 2 p.m thickness has been found in the molybdenum substrate. The thermal shock experiment of the tungsten coatings from room temperature to 1400℃ about 20 times shows that the tungsten coatings can adhere well to the molybdenum substrate. The content of oxygen and other impurity elements in the interface will bring a bad affection to the adhesion.
出处
《稀有金属材料与工程》
SCIE
EI
CAS
CSCD
北大核心
2005年第12期2013-2016,共4页
Rare Metal Materials and Engineering
