摘要
等离子体源离子注入是用于材料表面改性的一种新的、廉价的、非视线技术．它将待注入的靶直接浸泡在等离子体源中，并在靶上施加一系列负高压脉冲，离子在等离子体同靶表面形成的等离子体鞘层中被加速，并注入到靶中．本文使用流体动力学模型．对平面靶的碰撞等离子体鞘层的时空演化进行了计算机模拟．分别得到了所加电势为矩形波和梯形波时鞘层边界演化、靶表面电势分布和离子速度时空演化等参量．得到了与解析结果一致的数值模拟结果．模拟结果还表明当中性气体气压≤0．1mTorr时．离子在鞘层中的碰撞效应可忽略不计．
Plasma source ion implantation is a process in which a target is pulse biased to a high negative voltage to form an expanding plasma sheath. In this paper,we perform the fluid.dynamic modle of PSII for collisional plasma in planar geometry by solving a group of differential equations numerically. The fluid dynamic simulation of collisional sheath evolution in planar has been compared successfully with analytical results.
