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X射线成像光学的新进展:Bragg-Fresnel多层膜元件 被引量:1

A New Opportunity at X-Ray Optics:Bragg-Fresnel Multilayer Elements
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摘要 简要叙述了X射线反射式衍射光学元件──Bragg-Fresnel多层膜元件产生和发展的过程。介绍了它的基本原理及它的设计和制作步骤。对其应用前景作了简要分析,并对开展这方面的研究工作提出了一些设想。 This puper discribes the so--called Bragg-Fresnel structure which combines the Braggreflection of multilayer with Fresnel diffraction of zone plate. In soft X--ray wavelengthregion such structures have both high reflectance and spatial resolution, it might beemployed, therefore, as imaging and/or dispersing elements in optical systems. Themethods of design and manufacture are briefly introduced with an essential research project.
出处 《光学精密工程》 EI CAS CSCD 1996年第2期1-6,共6页 Optics and Precision Engineering
基金 国家自然科学基金
关键词 多层膜 刻蚀 X射线 光学元件 衍射 反射 Multilayer, Etching, Bragg reflection on the multilayer, Fresnel diffracting effect
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参考文献8

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同被引文献11

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