摘要
利用磁控溅射的方法,在热玻璃基片上制备了以Ag,Ti,Cu,Cr,Pt和Ta为底层的[Fe/Pt]n多层膜,后经不同温度真空热处理,得到L10有序结构的FePt薄膜(L10-FePt).实验结果表明,以Ag和Ti为底层,通过采用基片加温,同时利用[Fe/Pt]n多层膜结构,可以促进FePt薄膜的有序化过程,使FePt-L10有序化温度从500℃降低到350℃.在较高的温度下退火,以Ag为底层对薄膜的磁性能影响较小,而以Ti为底层在高于500℃退火后,矫顽力明显下降.在400℃退火20min后,以Ag和Ti为底层的样品平行膜面的矫顽力分别达到597kA/m和645kA/m,剩磁比分别达到0·81和0·94,为将来FePt-L10有序相合金薄膜用于未来超高密度磁记录介质打下基础.
The Fe/Pt multilayers with Ag, Ti, Cu, Cr, Pt and Ta underlayers were prepared by DC magnetron sputtering on the heated glass substrates. After vacuum annealing at different temperatures, the FePt thin films with L10 ordering phase （Llo-FePt） were obtained. Results showed that the Ag and Ti underlayer prompt the ordering of FePt thin films, and the ordering temperature of FePt- L10 phase is reduced by at least 150℃. It is also worth noting that the annealing time is shorter and the magnetic performance is excellent. The magnetic performance of samples with Ag underlayer is not sensitive to temperature at relative higher annealing temperature, whereas the coercivity of samples with Ti underlayer decreases obviously when the annealing temperature is higher than 500℃. After annealing at 400℃ for 20 min, the in-plane coercivity of samples with Ag and Ti underlayer can be as high as 597kA/m, and 654kA/m, respectively, and the ratio of remanent magnetization to saturation magnetization reaches 0.81 and 0.94, respectively, implying the potential of the films as future magnetic recording media of ultrahigh density.
出处
《物理学报》
SCIE
EI
CAS
CSCD
北大核心
2005年第10期4898-4902,共5页
Acta Physica Sinica
基金
教育部博士点基金(批准号:2003008003)
教育部科学技术研究重要项目(批准号:104023)资助的课题.~~
