摘要
对现有真空镀膜系统进行了改进,在原系统中增加了定向装置和5个控制装置,可实现定向镀膜和有效地控制膜厚,进而显著提高膜层质量.
A common vacuum deposition system is improved that a directional device and five autocontrol devices are equipped, so that the directional deposition and the effective control of film thickness can be achieved. Thus the quality of deposition film is remarkably enhanced.
出处
《物理实验》
2005年第9期45-47,共3页
Physics Experimentation
关键词
真空镀膜
自动控制
膜厚
vacuum deposition
autocontrol
film thickness
