摘要
本文主要介绍采用磁控溅射制备Ni-Cr薄膜的方法,并通过光刻、腐蚀,找到最佳的腐蚀条件,得到符合要求的N i-Cr薄膜,并把它应用到具体电路中,取得满意的效果。
An approach of the Ni - Cr thin film preparation by magnetron sputtering is introduced. The right conditions can be gained through the progresses of photo- etching and etching. The experiments with the Ni - Cr thin film used in some circuits come off satisfactorily.
出处
《微处理机》
2005年第4期7-8,共2页
Microprocessors
关键词
磁控溅射
Ni-Cr薄膜
Magnetron Sputtering
Ni - Cr thin film
