摘要
通过测定纳米硅薄膜的透射谱,建立计算模型计算得出薄膜样品的折射率、厚度、吸收系数和光能隙。计算结果表明这种半导体材料在620 nm波长附近的折射率约为3.4,计算得到的厚度与用台阶仪测量的结果吻合很好。在620 nm波长附近的吸收系数介于吸收系数较小的晶体硅与吸收系数较大的非晶硅之间,光能隙约为1.6 eV,两者都随晶态含量增大而呈减小趋势。
By measuring transmission spectra of nano-crystalline silicon films,the refractive index, thickness,photo-absorption coefficient and optical gap of the nano-crystalline silicon films were investigated utilizing an established computation model. The results show that the refractive index of the semiconductor material is about 3.4 at 620 nm,and the calculated film thickness is well fitted with the measurement results by a-step profile. At 620 nm, the value of photo-absorption coefficient is between crystalline silicon with the low photo-absorption coefficient and amorphous silicon with the high photo-absorption coefficient, and the optical band gap is about 1.6 eV,and both of which show degressive tendency with the increase of crystalline composition in the films.
出处
《半导体光电》
EI
CAS
CSCD
北大核心
2005年第4期327-329,334,共4页
Semiconductor Optoelectronics
关键词
纳米硅薄膜
折射率
吸收系数
光能隙
nano-crystalline silicon films
refractive index
photo-absorption coefficient
optical band gap
