摘要
考察了各种硫酸盐溶液中浸泡过的水化硅酸钙(C-S-H)对SO42-离子的吸附量及其相应条件下C-S-H的ζ电位。应用表面物理化学原理分析了C-S-H表面对SO42-的吸附特性。实验结果表明:C-S-H对SO42-的吸附量随溶液的浓度及溶液中阳离子的电价而变化,在高浓度Al2(SO4)3溶液中浸泡的C-S-H对SO42-的吸附能力明显增大。被吸附的SO42-不容易进入吸附层而主要分布在扩散层。扩散层中SO42-仍可能处于C-S-H表面的长程vanderWaals力的吸引作用之下。SO42-滞留于C-S-H表面的程度与溶液的离子强度有关。
The amount of SO4^2- ions adsorbed by a surface composed of calcium silicate hydrate （C-S-H）, after being dipped in various sulphate solutions, and the zeta potential of C-S-H under the corresponding conditions were investigated. TheC-S-H surface＇s properties for the absorption of SO4^2- ions was analyzed using the principle of surface physical chemistry. The experimental results show that the amount of SO4^2- ions adsorbed by a C-S-H surface varies with the changes of the concen- tration and the electrovalence of cations in the solution, and after the ions are dipped in high concentration Al2 （SO4）3 solutions, the adsorption capaeityof C-S-H for SO4^2- ions increases markedly. The SO4^2- ions adsorbed do not easily enter into the Stern layer, but are distribute mainly in the diffuse layer. The SO4^2- ions located in the diffuse layer are still likely to be under the attraction of a long distance van der Walls force. The extent to which SO4^2- ions are bound on an C-S--H surface is correlated with the intensity of ions in the solution.
出处
《硅酸盐学报》
EI
CAS
CSCD
北大核心
2005年第8期926-929,共4页
Journal of The Chinese Ceramic Society
基金
河北省自然科学基金(503353)资助项目。
关键词
水化硅酸钙
吸附
ξ电位
硫酸根离子
凝胶
calcium silicate hydrate
adsorption
zeta potential
sulfate ion
gel
