摘要
通过真空蒸镀方法在硅片和玻片上制备了TiNiPd合金薄膜,使用能谱仪、差示扫描量热法和X射线衍射等方法,研究了薄膜的成分及随退火温度上升的晶化和结构变化情况。结果表明:真空蒸镀薄膜成分偏离镀材成分,钛含量降低,钯、镍含量升高;真空蒸镀薄膜的晶化温度在600℃左右;B2相、B19相和B19′相是真空蒸镀薄膜在晶化处理后的主要组成相;450℃×5 h预处理促进B2相向B19′相转变。
Using vacuum evaporation, TiNiPd alloy films were made on glass slide and Si wafer. The composition and crystallizing point of the films were determined by EDX and DSC, respectively. The change of structure and crystallinity in the films with increasing annealing temperature was investigated using XRD. The components of the films were not the same as those of evaporated material, Ti decreased but Pd and Ni increased. The crystallizing point of the films was about 600 ℃, B2, B19 and B19＇ were chief phases in the films after crystallization. Per-crystallization at 450 ℃ for 5 h would accelerate the transformation from 132 to B19＇ in the films.
出处
《机械工程材料》
CAS
CSCD
北大核心
2005年第8期26-29,共4页
Materials For Mechanical Engineering
基金
高等学校博士学科点专项基金资助项目(20020248037)
上海市科技发展基金资助项目(02DJ14042)
