摘要
研究了磁控溅射镀膜工艺参数中溅射功率、溅射时间以及真空度等对不锈钢薄膜制备的影响,通过对获得的不锈钢薄膜层进行金相分析与其他性能测试发现:试验中溅射功率为100W、溅射时间为2h、真空度为0.08Pa、氩气压力为1.5MPa的条件下制得的薄膜性能最佳。
The influence of the parameters such as magnetron sputtering power, time of magnetron sputtering and on vacuum on the fabrication of stainless steel thin films was studied. It was metalloscopy and other performance tests of the stainless steel films were performed, found out that the film prepared under the power of 100W and time of 2 hours had the best performance.
出处
《机械工程材料》
CAS
CSCD
北大核心
2004年第11期13-15,共3页
Materials For Mechanical Engineering
关键词
磁控溅射
薄膜
不锈钢
magnetron sputtering
thin film
stainless steel
