摘要
对等离子体化学气相沉积(PCVD)过程进行了实验和理论研究,实验结果表明:实验条件和等离子体参数在PCVD过程中相互关联,等离子体参数直接影响PCVD过程,在此实验结果的基础上建立了一个二元动力学模型,假设PCVD过程是由等离子体参数决定,考虑了活性粒子与反应单体的扩散与对流.计算中使用了实际测量的电子参数.理论与实验结果基本符合.
An experimental and theoretical analysis of the plasma chemical vapor deposition (PCVD) process is presented in this paper. Experimental results show that the plasma parameters and the experimental conditions are correlated with each other, and the PCVD process is directly affected by the plasma parameters. According to these experimental results, we establish a two-dimensional kinetic model, assuming the PCVD process is controlled by the plasma parameters, the convective and diffusion of radical and precursor gas are taken into account. The electron parameters measured by the experiment are used in the model. The theoretical results is in good agreement with the experimental results.
出处
《物理学报》
SCIE
EI
CAS
CSCD
北大核心
1995年第8期1237-1243,共7页
Acta Physica Sinica
