摘要
研究了反应阴极弧镀过程中Ｎ２流量及弧电流强度对Ｔｉ阴极耗损率的影响，以及Ｎ２耗损与Ｔｉ阴极耗损间的关系，并对各种情况下的镀层进行结构分析。试验表明Ｔｉ阴极耗损率与Ｎ２流量有关，且在弧镀过程中，只要保持Ｎ２在真空室中有一定的压力，单位时间内Ｎ２耗损的原子数与Ｔｉ阳极耗损的原子数的比约为１：１．镀层沉积速度与结构取决于Ｎ２流量和弧电流强度。
The Ti cathode erosion rate and the relationship between N2 con-sumption and Ti cathode weight loss on different arc current and N2 flow are in-vestigated.The coatings under different conditions are analyzed by X-ray diffrac-tion.Results show that Ti cathode erosion rate is related to the N,flow,and the ratio of N to Ti atom consumption is about 1:1 if there is a N2 partial pressure in the chamber in reactive cathodic arc deposit.The TiN deposit rate and its struc-ture depend on arc current and N2 flow.
出处
《江苏理工大学学报（自然科学版）》
1995年第6期6-10,共5页
Journal of Jiangsu University of Science and Technology(Natural Science)
