期刊文献+

微型机械旋转运动动态参数测试仪研究 被引量:2

Study on Instrument of Revolving Micromachine Dynamic measurement
在线阅读 下载PDF
导出
摘要 在“微型机械旋转运动动态参数测试仪”研制过程中采用微动光阑提取微电机动态信号,此微动光阑连续可调,直至闭合,其微调量比普通光阑小几倍至一个数量级,可提取光束直径在0~2mm以内的光信号,再配以光敏接收器的选择和部份机械结构的设计,成功地实现了微弱动态信号的提取,这对尚处于摸索阶段的微图形动态测量具有重要意义。 In accordance with the measuring characteristic,a scheme of untouched measurementbased on the optoelectronic measurement principle in reflect style is presented.The focalpoint of the work is drawing faint revolving signal,thus designed a precision optical fence,which may be continuously adjusted untill to be closed.its fine tuning quantity is much lessthan ordinary optical fence(so far as to reach a order of magnitute),using this optical fencemay pick up the signal that light spot diameter in range of 0 to 2mm. Adopting this precisionoptical fence,cooperating with choosing corectly photoelectric receiver and designing a part ofmachanical structure,realized the drawing to faint revolving signal.This is importance formicropicture dynamic measuremant in the stage of exploring.
出处 《光学精密工程》 EI CAS CSCD 1995年第4期66-73,共8页 Optics and Precision Engineering
关键词 微机械 动态测量 微电机 Micromachine, Dynamic measurement,Faint revolving signal drawing,Preci-sion optical fence ,Photosensitive receiver
  • 相关文献

同被引文献42

  • 1张二星.微型机械运动参数测试仪光学机械系统研究[J].光学精密工程,1996,4(2):48-52. 被引量:5
  • 2徐锡林.微位移高精度测量控制设计[J].现代计量测试,1997,5(1):11-14. 被引量:3
  • 3TEKALP A M 崔之祜译.数字视频处理[M].北京:电子工业出版社,1998..
  • 4DAVIS C Q, FREEMAN D M. Using a light microscope to measure motions with nanometer accuracy[J]. Optical Engineering, 1998,37:1299-1304.
  • 5HART M, CCONANT R, LAU K. Time-resolved measurement of optical MEMS, using stroboscopic interferometry[A]. Proc. Transducers '99[C]. Sendai, Japan, 1999.470-473.
  • 6XIE H K, ERDMANN, JING Q, et al. Simulation and characterization of a CMOS Z-axis microactuator with electrostatic comb drives[A]. 2000 International Conference on Modeling and Simulation of Microsystems-MSM[C]. San Diego,2000.181-184.
  • 7PRUITT B, CHOI D H, FLORANDO J, et al. Low force electrical contact measurements using piezoresistive cantilevers to characterize thin-film metallization[A]. Transducers '01/EuroSensors XV 2001[C]. Munich, Germany, Springer,2001.1032-1035.
  • 8DONATI S, NORGIA M, ANNOVAZZI-LODI V, et al. Measurement of MEMS mechanical parameters by injection interferometry[A]. Proc of International conference on Optical MEMS,2000[C]. Sheraton Kauai, USA,2000.89-90.
  • 9<计量测试技术手册>编辑委员会.计量测试技术手册[M].北京:中国计量出版社,1997.Editor committee of the handbook of measurement and testing. Handbook of measurement and testing(vol.2)[M]. Beijing: China Metrology Press,1997.(in Chinese)
  • 10VIRGINIA TECHNOLOGIES Inc. Thickness measurement of micromachined silicon wafers using machine vision[EB/OL]. http://www.vatechnologies.com/omms.htm, 2002-9-15.

引证文献2

二级引证文献14

相关作者

内容加载中请稍等...

相关机构

内容加载中请稍等...

相关主题

内容加载中请稍等...

浏览历史

内容加载中请稍等...
;
使用帮助 返回顶部