摘要
在大规模集成电路生产中，对掩膜版与硅片刻线宽度的在线检测是保证质量的重要手段。本文介绍了一种高精度，自动化的线宽测量仪。阐述了其原理，构成及设计中有关问题。经实验表明：该仪器的重复测量精度≤±０．００５μｍ；测量精度为±０．０２μｍ。
In LSI production,an important means of guaranteeing quality is to test the linewidthof photomasks and wafers on line,This paper introduces an automatic linewidth measuring instrument with high accuracy,elaborates its principle,constitution and some problems in design. The tests show:its repeatabiiity is up to±0.005μm,accuracy is ±0.02μm。
出处
《光学精密工程》
EI
CAS
CSCD
1994年第1期83-88,共6页
Optics and Precision Engineering
关键词
线宽测量
显微镜
集成电路
纳米级
Linewidth measurement,Microscope,Image collection,Microcomputer processing
