摘要
本文对光CVD反应系统的气流模式进行了分析,讨化了4种不同的气流流动状态,计算出附面层线性底层厚度为0.163mm,提出用保护气体隔离工作气体,以防止石英窗内侧面淀积薄膜的可行性.
The gas floe mode in Photo-CVD system has been analysied in this paper. Four kinds of different status of gas flow was discussed. The thickness of linear bottom layer of boundary-layer was calculated to be 0.163mm. It is presented that a kind of passive gas be used to separate the reactive gas from the quartz window to avoid the possibility of film deposition on the inner surface of the window.
出处
《微电子学与计算机》
CSCD
北大核心
1993年第11期42-43,46,共3页
Microelectronics & Computer
