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低气压掺氪混合气放电XeF(C-A)激光 被引量:1

DISCHARGE XeF (C-A) LASER AT REDUCED GAS PRESSURE FOR A Kr-DOPING MIXTURE
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摘要 于0.22MPa气压和2.76MW/cm^3泵浦速率下,在商品准分子激光器上实现放电激励XeF(C-A)宽带自由振荡。使用峰值净益为1.24%/cm的掺氪四元混合气,获得兰绿激光输出1.17mJ,比能量输出9mJ/L,增本征效率0.016%,中心波长477nm,带宽32nm(FWHM)。 The free running XeF (C-A)lasing was achieved in a commercial discharge excited excimer laser at reduced gas pressure of 0.22MPa and moderate pump rate of 2.76MW/cm3, using a four-component gas mixture doped by Kr with a net peak gain of 1.24%/cm. The laser output, energy density and intrinsic efficiency were 1.17mJ, 9mJ/ L and 0.016%, respectively. The laser spectrum showed a peak wavelength at 477nm and a bandwidth of 32nm (FWHM ).
出处 《强激光与粒子束》 EI CAS CSCD 1993年第1期37-41,共5页 High Power Laser and Particle Beams
关键词 放电 氟化氙 准分子激光 激光器 XeF (C-A) laser, free running, discharge excitation.
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