期刊文献+

在二甲基亚砜中电沉积Tm-Fe合金的研究 被引量:2

Electrodepositing of Tm-Fe Alloy in Dimethylsulfoxide
在线阅读 下载PDF
导出
摘要 高温下电沉积制备稀土铥及其合金的设备易腐蚀、能耗大。采用脉电沉积技术研究了室温下在有机溶剂二甲基亚砜中脉冲电沉积制备Tm -Fe合金 ,讨论了配位体对Tm -Fe合金电沉积的影响 :不用配位体时 ,稀土元素铥在沉积层中含量较高 ,但表面粗糙、附着力差 ,使用 3种不同的配位体都能改善沉积层的质量 ,其中以柠檬酸效果最好 ,置于空气中依然保持光亮 ,不易氧化。用扫描电子显微镜 (SEM)观察了Tm -Fe合金膜表面形貌 ,结果表明 ,沉积层金属颗粒呈球形、堆积较紧密 ,粒径大约为 30 0nm。X射线衍射分析表明 :室温下所得合金膜衍射峰是弥散的包峰 ,所得到的合金膜是非晶态的。 Corrosion of equipment and high energy - loss usually exist in the production of rare earth Tmand its alloys by electrodepositing under high temperature. Tm-Fe alloy was prepared by pulse technique in dimethylsulfoxide (DMSO) at room temperature, and the effects of three comple-xing agents were studied. Without complexing agent the content of rare earth Tm element is higher in the deposit but the depositing surface is roughness with bad adhesion. Three complexing agents all can improve the electrodepositing quality of Tm - Fe alloy films, and the citric acid is the best with which the alloy film is even and with metallic lustrous and oxidation resistance while exposed in the air. The Tm - Fe alloy films were characterized by scanning electron microscope (SEM) . The metallic grains on the deposit are compact and spherical with diameter about 300 nm. The Tm- Fe alloy films obtained at room temperature are amorphous by x - ray diffraction (XRD).
出处 《材料保护》 CAS CSCD 北大核心 2004年第8期7-8,共2页 Materials Protection
基金 广东省自然科学基金资助课题 ( 0 112 15 )
关键词 Tm-Fe合金 电沉积 配位体 二甲基亚砜溶剂 Tm-Fe alloy electrodepositing complexing agent
  • 相关文献

参考文献8

  • 1Lim C M, Edwards C, Dixon S, et al. Ultrasound studies of single crystal thulium in an applied magnetic field [J]. Journal of Magnetism and Magnetic Materials, 2001 (234): 387 ~ 394.
  • 2Harker S J, Stewart G A M, Gubbens P C. Magnetic order and crystal fields in the puma phases of Tm2 BaTO5 ( T = Co and Ni)[J].Journal of Alloys and Compounds, 2000 ( 307 ): 70 ~ 76.
  • 3Dudas J, Alexander F, Kavecansky V. Unusual electrical resistivity anomalies of thulium thin films at low temperatures [ J ].Journal of Alloys and Compounds, 1998(278): 1 ~5.
  • 4Thomas P, Braun , Francis J, et al. Crystal structure of Tm2·Ni12P7 [ J ]. Journal of Alloys and Compounds, 2000 ( 307 );111 -113.
  • 5Thomas P, Braun, Francis J, et al. Transport properties of intermetallic thulium compounds [J]. Journal of Alloys and Compounds, 2000 (305): 43 ~ 48.
  • 6Venturini G, Welter R. Single crystal refinement of tetragonal Tm3 ( Ga, Ge) 5 with anti- Cr5 B3 structure [ J ]. Journal of Alloys and Compounds (Letter), 2000(299): L9 ~ 11.
  • 7丘开容,杨绮琴,管彤.Tm(Ⅲ)在氯化物熔体中电还原的研究[J].稀有金属,1997,21(1):7-11. 被引量:4
  • 8Yuan D S, Liu G K, Tong Y X. Electrochemical behavior of Tm3 + ion and cyclic electrodeposition of a Tm- Co alloy film in dimethylsulfoxide [ J]. J Electroanal Chem, 2002, 536 (1 ~2): 123.

二级参考文献2

  • 1章复中,谷力军.镁—稀土二元系相图[J]稀土,1982(02).
  • 2章复中,谷力军.鉄—稀土二元系相图[J]稀土,1981(01).

共引文献3

同被引文献23

引证文献2

二级引证文献1

相关作者

内容加载中请稍等...

相关机构

内容加载中请稍等...

相关主题

内容加载中请稍等...

浏览历史

内容加载中请稍等...
;
使用帮助 返回顶部