摘要
光刻机的匹配使用是半导体工艺大生产线上提高生产效率的一项重要措施。光刻机的匹配主 要包括场镜误差的匹配和隔栅误差的匹配,如何调整相同型号光刻机的匹配使用将是本文论述的重点。
On a mass production line,multiple Step-and-Repeat system are generally used in a manufacturing system. The specification for each machine maybe slightly diffetent. It will be discussed how to adjust the accuracy of each and match the Intrafield Error and grid Error of each machine.The Article will be concerned to discuss the matching for same type Step-and-Repeat system.
出处
《电子与封装》
2003年第3期40-44,共5页
Electronics & Packaging
关键词
套刻精度
误差
匹配
调整
Alignment
Accuracy
Error
Match
Adjusting
