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Surface segregation-intensified physical vapor deposition of TiO_(2) on polyether sulfone membranes for enhanced antifouling performances
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作者 Hong-Jian Wang Hai-Xia Wang +6 位作者 Yang-Yang Song Ke-Wei Qiu Yu-Zhu Liu Guo-Cheng Yao Wen-Liang Li Ya-Nan Liu Fu-Sheng Pan 《Rare Metals》 2025年第5期3362-3375,共14页
Coating techniques are efficient routes to modify surface property of composite membranes for enhanced membrane separations.However,it remains challenge to deposit continuous inorganic layers on hollow fiber substrate... Coating techniques are efficient routes to modify surface property of composite membranes for enhanced membrane separations.However,it remains challenge to deposit continuous inorganic layers on hollow fiber substrates.This study combines surface segregation with physical vapor deposition(PVD)to construct intensified TiO_(2)layers on polyether sulfone(PES)hollow fiber substrates.During membrane fabrication,polyethylene-polypropylene glycol(F127)is used as surface segregation agent in casting solution,which enables PES hollow fibers with abundant hydroxy groups,thus improving the compatibility between PES and vaporized TiO_(2).The obtained PES/F127@TiO_(2)membranes exhibit tight TiO_(2)layers with tunable thickness,high mechanical strength,narrowed pore size and enhanced hydrophilicity.Moreover,the optimized PES/F127@TiO_(2)membranes show competitive antifouling performances in water treatment,with a water permeability up to 97 L·m^(-2)·h^(-1)·bar^(-1)and bovine serum albumin(BSA)rejection of~99%.This work is expected to provide a material design idea to deposit functional layers on polymers for fortified performances. 展开更多
关键词 Surface segregation Membrane separation Antifouling performance physical vapor deposition TiO_(2)coating
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Plasma spray-physical vapor deposition toward advanced thermal barrier coatings:a review 被引量:14
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作者 Mei-Jun Liu Gao Zhang +5 位作者 Yan-Hong Lu Jia-Qi Han Guang-Rong Li Cheng-Xin Li Chang-Jiu Li Guan-Jun Yang 《Rare Metals》 SCIE EI CAS CSCD 2020年第5期479-497,共19页
Plasma spray–physical vapor deposition(PS–PVD)is a unique technology that enables highly tailorable functional films and coatings with various rare metal elements to be processed.This technology bridges the gap betw... Plasma spray–physical vapor deposition(PS–PVD)is a unique technology that enables highly tailorable functional films and coatings with various rare metal elements to be processed.This technology bridges the gap between conventional thermal spray and vapor deposition and provides a variety of coating microstructures composed of vapor,liquid,and solid deposition units.The PS–PVD technique serves a broad range of applications in the fields of thermal barrier coatings(TBCs),environmental barrier coatings(EBCs),oxygen permeable films,and electrode films.It also represents the development direction of high-performance TBC/EBC preparation technologies.With the PS–PVD technique,the composition of the deposition unit determines the microstructure of the coating and its performance.When coating materials are injected into a nozzle and transported into the plasma jet,the deposition unit generated by a coating material is affected by the plasma jet characteristics.However,there is no direct in situ measurement method of material transfer and deposition processes in the PS–PVD plasma jet,because of the extreme conditions of PS–PVD such as a low operating pressure of*100 Pa,temperatures of thousands of degrees,and a thin and high-velocity jet.Despite the difficulties,the transport and transformation behaviors of the deposition units were also researched by optical emission spectroscopy,observation of the coating microstructure and other methods.This paper reviews the progress of PS–PVD technologies considering the preparation of advanced thermal barrier coatings from the perspective of the transport and transformation behaviors of the deposition units.The development prospects of new high-performance TBCs using the PS–PVD technique are also discussed. 展开更多
关键词 Plasma spray–physical vapor deposition (PSpvd) deposition unit Cross-domain behavior deposition mechanism Thermal barrier coatings (TBCs)
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Characteristic Length of Metallic Nanorods under Physical Vapor Deposition
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作者 Kai Jun Bo-Jun Wang Hai-Yuan Chen 《Journal of Electronic Science and Technology》 CAS CSCD 2020年第4期350-357,共8页
By using physical vapor deposition(PVD)to grow metallic nanorods,the characteristic length is controllable,which can be identified by two different growth modes:Mode I and Mode II.In Mode I,the growth of metallic nano... By using physical vapor deposition(PVD)to grow metallic nanorods,the characteristic length is controllable,which can be identified by two different growth modes:Mode I and Mode II.In Mode I,the growth of metallic nanorods is dominated by the monolayer surface steps.Whereas in Mode II,the growth mechanism is mainly determined by the multilayer surface steps.In this work,we focused on the analysis of the physical process of Mode I,in which the adatoms diffuse on the monolayer surface at beginning,then diffuse down to the next monolayer surface,and finally result in the metallic nanorods growth.Based on the physical process,both the variations of the characteristic length and the numerical solutions were theoretically proposed.In addition,the twodimensional(2 D)lattice kinetic Monte Carlo simulations were employed to verify the theoretical derivation of the metallic nanorods growth.Our results pay a new way for modifying the performance of metallic nanorods-based applications and devices. 展开更多
关键词 Characteristic length metallic nanorods Monte Carlo physical vapor deposition(pvd)
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^(60)Co Gamma Irradiation and Annealing Effects on Transport Properties of Antimony Telluride Platelets Grown by Physical Vapor Deposition
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作者 Thankamma George A.G.Kunjomana 《Acta Metallurgica Sinica(English Letters)》 SCIE EI CAS CSCD 2015年第5期559-566,共8页
Physical vapor deposition method was employed to deposit antimony telluride (Sb2Te3) crystals in a dual-zone furnace. The microstructure, surface topography and composition of samples were characterized using X-ray ... Physical vapor deposition method was employed to deposit antimony telluride (Sb2Te3) crystals in a dual-zone furnace. The microstructure, surface topography and composition of samples were characterized using X-ray diffraction, atomic force and scanning electron microscopy. Seebeck coefficient (Sic), electrical conductivity (σ⊥c) as well as power factor (PF) were enhanced for pure Sb2Te3 samples upon annealing, and the samples annealed at 473 K exhibited the highest PF of 3.16 × 10^-3 W m-1K-2 with an enhancement of 22% in the figure of merit (Z). When the delivered dose of 60Co gamma radiation was increased from 0 to 30 kGy in the stoichiometric crystals, σ⊥c decreased due to the decrease in mobility. As a result of the increase in S, PF and Z improved by 12.11 and 13.7%, respectively, in the 30 kGy gamma- irradiated crystals. Both RH (BIIc) and S⊥c were positive, suggesting that the prepared Sb2Te3 crystals retained the p-type semiconductivity after these treatments. 展开更多
关键词 Antimony telluride physical vapor deposition IRRADIATION ANNEALING CONDUCTIVITY Seebeck coefficient
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Preparation and mechanical properties of NiCoCrAlY/NiCr laminates by electron beam physical vapor deposition
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作者 韩杰才 李垚 +3 位作者 赫晓东 孟松鹤 曾岗 陈宏平 《中国有色金属学会会刊:英文版》 CSCD 2005年第S3期53-56,共4页
Laminates with alternating layers of NiCoCrAlY and NiCr were fabricated by using electron beam physical vapor deposition (EB-PVD) method. The influence of the substrate temperature on morphology of the laminates was i... Laminates with alternating layers of NiCoCrAlY and NiCr were fabricated by using electron beam physical vapor deposition (EB-PVD) method. The influence of the substrate temperature on morphology of the laminates was investigated. The results show that in order to produce NiCoCrAlY/NiCr laminates with lower porosity, higher substrate temperature is required. The mechanical properties of the as-deposited samples and heat-treated samples were examined using tensile tests. The stress-strain curve of the as-deposited laminate shows a typical characteristic of multilayered materials and the fracture behavior is improved by annealing the samples at high temperatures. The tensile strength of the samples annealed at 760℃ is 658.4MPa, and the elongation reaches 6.2%. 展开更多
关键词 NiCoCrAlY/NiCr LAMINATE electron beam physical vapor deposition (EB-pvd) TENSILE test SUBSTRATE temperature
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Kinetic Monte Carlo simulation of physical vapor deposition of thin Cu film
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作者 WANG Jun CHEN Chang-qi ZHU Wu 《中国有色金属学会会刊:英文版》 CSCD 2004年第z1期463-467,共5页
A two-dimensional Kinetic Monte Carlo method has been developed for simulating the physical vapor deposition of thin Cu films on Cu substrate. An improved embedded atom method was used to calculate the interatomic pot... A two-dimensional Kinetic Monte Carlo method has been developed for simulating the physical vapor deposition of thin Cu films on Cu substrate. An improved embedded atom method was used to calculate the interatomic potential and determine the diffusion barrier energy and residence time. Parameters, including incident angle,deposition rate and substrate temperature, were investigated and discussed in order to find their influences on the thin film morphology. 展开更多
关键词 physical vapor deposition KINETIC MONTE Carlo METHOD embedded ATOM METHOD THIN film growth simulation morphology
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Preparation of Ti-Al alloy sheet by electron beam physical vapor deposition
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作者 马李 赫晓东 孙跃 《中国有色金属学会会刊:英文版》 CSCD 2007年第A01期477-481,共5页
Ti-Al thin sheet with dimension of 450 mm×450 mm×0.2 mm was prepared by electron beam physical vapor deposition(EB-PVD) technology. The surface and cross-section pattern of as-deposited sample were studied b... Ti-Al thin sheet with dimension of 450 mm×450 mm×0.2 mm was prepared by electron beam physical vapor deposition(EB-PVD) technology. The surface and cross-section pattern of as-deposited sample were studied by SEM and AFM,and then the composition and phase were analysed by XRD and EPMA. Finally,the effect on deposit by re-evaporation of Al was explored by calculating the ratio of re-evaporating capacity with depositing capacity of Al on the substrate. The results indicate that the evaporation process with Nb addition into the molten pool makes it earlier to reach the steady-state. The existing equiaxed crystal and columnar crystal along the cross-sectional may be caused by the transformation latent heat released during the transition course of atoms from gaseous state to solid state. The effect on deposit by re-evaporation of Al can be neglected because the re-evaporating capacity of Al is far below that of the depositing capacity. 展开更多
关键词 电子束 物理性能
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316L不锈钢离子渗氮/PVD复合改性层的组织与性能 被引量:1
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作者 曹驰 张翔 +2 位作者 陈志林 陈东升 张琢 《金属热处理》 北大核心 2025年第1期299-307,共9页
为了提高不锈钢表面硬度、耐磨性和耐蚀性能,研究了单一离子渗氮和离子渗氮/物理气相沉积(PVD)复合处理工艺对316L奥氏体不锈钢组织、硬度、摩擦磨损及耐蚀性能的影响。结果表明,经单一离子渗氮处理的试样表面形成厚度约20μm、硬度约80... 为了提高不锈钢表面硬度、耐磨性和耐蚀性能,研究了单一离子渗氮和离子渗氮/物理气相沉积(PVD)复合处理工艺对316L奥氏体不锈钢组织、硬度、摩擦磨损及耐蚀性能的影响。结果表明,经单一离子渗氮处理的试样表面形成厚度约20μm、硬度约802 HV0.05的高氮硬化层;经渗氮/PVD复合处理的试样表面形成厚度约25μm、纳米硬度约29 GPa的改性层;两种工艺均形成了γ_(N)相,渗氮/PVD复合处理的试样表面形成的非晶薄膜未对中间层物相造成影响。与基体相比,单一渗氮试样在干摩擦和腐蚀摩擦工况下的摩擦因数分别降低至0.520和0.311;经渗氮/PVD复合处理试样则降低至0.074和0.119;单一渗氮试样和渗氮/PVD复合处理试样自腐蚀电流密度由4.602䦆Wingdings 2NC@10^(-8) A/cm^(2)分别降低至4.084䦆Wingdings 2NC@10^(-8) A/cm^(2)和3.318䦆Wingdings 2NC@10^(-8) A/cm^(2),自腐蚀电位由-0.213 V分别升高至-0.195 V和-0.182 V。综合比较,渗氮/PVD复合处理可以显著提高316L奥氏体不锈钢的表面硬度、耐磨性及耐蚀性。 展开更多
关键词 316L不锈钢 离子渗氮 物理气相沉积 组织 硬度 耐磨性 耐蚀性
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钛合金表面耐磨损PVD涂层及制备技术研究进展
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作者 李聪 刘健招 +3 位作者 周立波 陈维 陈汪林 陈荐 《机械工程材料》 北大核心 2025年第4期8-19,共12页
为提高钛合金表面的硬度及耐磨性能,常采用物理气相沉积(PVD)技术在其表面制备涂层。介绍了类金刚石涂层、改性氮化物涂层、复合氮化物涂层、梯度涂层等常见的PVD涂层,系统阐述了磁控溅射技术、离子镀技术、离子束辅助沉积技术、真空蒸... 为提高钛合金表面的硬度及耐磨性能,常采用物理气相沉积(PVD)技术在其表面制备涂层。介绍了类金刚石涂层、改性氮化物涂层、复合氮化物涂层、梯度涂层等常见的PVD涂层,系统阐述了磁控溅射技术、离子镀技术、离子束辅助沉积技术、真空蒸发镀技术等常用PVD技术的特点,归纳了基底偏压、溅射功率、沉积气压、沉积温度、阴极弧流等调控涂层磨损性能的工艺参数,指出了目前耐磨损PVD涂层制备存在的问题,并对其发展趋势进行了展望。 展开更多
关键词 钛合金 物理气相沉积 耐磨涂层 工艺参数
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Deposition of tungsten-titanium carbides on surface of diamond by reactive PVD 被引量:5
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作者 胡国荣 杨建红 +3 位作者 刘业翔 杨凯华 汤凤林 金继红 《中国有色金属学会会刊:英文版》 EI CSCD 1999年第4期838-841,共4页
The coatings of W-Ti carbides on the surface of diamond was obtained by using physical vapor deposition (PVD), during which WO3 powders pre-treated with hydrofluoric acid were reduced by titanium hydride in vacuum at ... The coatings of W-Ti carbides on the surface of diamond was obtained by using physical vapor deposition (PVD), during which WO3 powders pre-treated with hydrofluoric acid were reduced by titanium hydride in vacuum at 850 ℃. The resistance of diamond to corrosion at high-temperature was investigated. The formation of W-Ti carbides on the surface of diamond was verified by X-ray diffraction analysis, the interface state between diamond and matrix in metaLbase diamond composite was observed by scanning electron microscope. The results showed that the carbide coating is easy to be formed at low deposition temperature on the surface of diamond, while the resistance of diamond to corrosion at highutemperature and the strength of bonding between diarnond and metal matrix are effectively improved. 展开更多
关键词 DIAMOND physical vapor deposition (pvd) TUNGSTEN carbides TUNGSTEN
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Coating deposition regularity depended on orientation difference in PS-PVD plasma jet 被引量:7
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作者 Jie MAO Min LIU +4 位作者 Ziqian DENG Kui WEN Changguang DENG Kun YANG Zhikun CHEN 《Chinese Journal of Aeronautics》 SCIE EI CAS CSCD 2020年第12期3460-3468,共9页
The YSZ coatings are prepared by the plasma spray-physical vapor deposition(PS-PVD)technology based on a specific experimental design.The structure,thickness and growth angle of YSZ coatings on the entire circumferent... The YSZ coatings are prepared by the plasma spray-physical vapor deposition(PS-PVD)technology based on a specific experimental design.The structure,thickness and growth angle of YSZ coatings on the entire circumferential surface of the cylindrical sample are studied.The results indicated that the structure,thickness and deflection growth angle of YSZ coatings are related to the orientation of deposition location.The numerical simulation of the multiphase mixed fluid near the substrate is carried out and the deposition regularity and mechanism of YSZ coatings prepared by PS-PVD is deduced.The growth rate is related to the local characteristics of the plasma flow field,and is directly proportional to the field pressure and inversely proportional to the field velocity.The growth angle of the coating is generally affected by the flow direction of the plasma jet.Especially,the normal component of velocity vector,V_(norm),mainly affects the speed at which the coating grows vertically upwards.The tangential component of velocity vector,V_(tan),determines the degree that the coating growth direction deviates from the vertical direction.When V_(tan)≠0,the coating forms a fine column with a certain deflection angle and finally develops into an oblique columnar structure. 展开更多
关键词 deposition mechanism Flow field characteristic Numerical simulation Orientation difference Plasma spray–physical vapor deposition YSZ coating
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A perspective of microplasma oxidation (MPO) and vapor deposition coatings in surface engineering of aluminum alloys 被引量:1
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作者 AWAD Samir Hamid 《Journal of Chongqing University》 CAS 2004年第2期4-11,共8页
Over the past years, great achievements have been made in the development of coating technologies for surface improvement of aluminum alloys. Despite these achievements, the role in the market strongly depends on the ... Over the past years, great achievements have been made in the development of coating technologies for surface improvement of aluminum alloys. Despite these achievements, the role in the market strongly depends on the ability of surface coating technology under technical and economic considerations to meet the increased demands for heavy tribological applications of aluminum alloys. Microplasma oxidation (MPO) technology has recently been studied as a novel and effective means to provide thick and hard ceramic coating with improved properties such as excellent load-bearing and wear resistance properties on aluminum alloys. The present work covers the evaluation of the performances of current single and duplex coatings combining MPO, physical vapor deposition (PVD), and plasma assisted chemical vapor deposition (PACVD) coatings on aluminum alloys. It suggests that the MPO coating is a promising candidate for design engineers to apply aluminum alloys to heavy load-bearing applications. The prospective future for the research on MPO coatings is introduced as well. 展开更多
关键词 aluminum alloys microplasma oxidation (MPO) duplex coating physical vapor deposition (pvd) plasma assisted chemical vapor deposition (PACVD)
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PS-PVD双陶瓷层热障涂层热循环性能研究 被引量:1
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作者 李信瑜 李建超 +3 位作者 张雨生 李新慧 由晓明 何箐 《热喷涂技术》 2025年第1期119-129,共11页
下一代超高温热障涂层多以双陶瓷层结构存在,针对具有优良热力学性能、低热导率和高温相稳定的锆酸钆涂层材料,采用等离子物理气相沉积工艺制备了YSZ单陶瓷层和YSZ/(Gd_(0.9)Yb_(0.1))_(2)Zr_(2)O_(7)(YSZ/GYbZ)双陶瓷层热障涂层,对涂层... 下一代超高温热障涂层多以双陶瓷层结构存在,针对具有优良热力学性能、低热导率和高温相稳定的锆酸钆涂层材料,采用等离子物理气相沉积工艺制备了YSZ单陶瓷层和YSZ/(Gd_(0.9)Yb_(0.1))_(2)Zr_(2)O_(7)(YSZ/GYbZ)双陶瓷层热障涂层,对涂层1 100℃热循环条件下的寿命和失效模式进行了分析。结果表明,YSZ/GYbZ和YSZ准柱状结构涂层热循环2 650次和950次后失效,TGO生长以及热膨胀不匹配引发的应力使TGO内部和TGO与陶瓷层之间产生裂纹,导致涂层失效;烧结退化导致柱状结构涂层收缩及层间断裂是另外一种典型失效形式。 展开更多
关键词 热障涂层 等离子喷涂-物理气相沉积 锆酸钆 热循环
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模具表面采用PVD制备多层硬化膜研究的进展
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作者 毛雨姗 刘宁 刘爱军 《热处理》 2025年第2期1-6,23,共7页
随着制造业的快速发展,对模具的表面性能要求也越来越高。物理气相沉积(PVD)技术具有操作简单、成本较低等优点,能在模具表面制备硬度较高、结合力较大的多层膜。基于此,简要介绍真空蒸镀、溅射镀、离子镀等PVD技术的发展,以及氮化物膜... 随着制造业的快速发展,对模具的表面性能要求也越来越高。物理气相沉积(PVD)技术具有操作简单、成本较低等优点,能在模具表面制备硬度较高、结合力较大的多层膜。基于此,简要介绍真空蒸镀、溅射镀、离子镀等PVD技术的发展,以及氮化物膜、多元膜、多层膜等硬化膜的研究进展。 展开更多
关键词 模具 表面性能 多层膜制备 物理气相沉积(pvd)
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Fabrication, microstructure and properties of electron beam-physical vapor deposited TiAl sheet and TiAl/Nb laminated composites
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作者 韩杰才 章德铭 +2 位作者 陈贵清 孟松鹤 张幸红 《中国有色金属学会会刊:英文版》 CSCD 2006年第B02期449-452,共4页
The TiAl-based alloys sheet with 150 mm×100 mm×0.4 mm and the TiAl/Nb laminated composites with 150 mm×100 mm×0.2 mm were fabricated by using electron beam-physical vapor deposition(EB-PVD) method,... The TiAl-based alloys sheet with 150 mm×100 mm×0.4 mm and the TiAl/Nb laminated composites with 150 mm×100 mm×0.2 mm were fabricated by using electron beam-physical vapor deposition(EB-PVD) method, respectively. The microstructure and properties of the sheet were investigated by AFM, SEM and EDS. The results show that the TiAl based alloys sheet has a good surface quality, and its microstructure is columnar crystal. The component of the alloys indicates a regular and periodical gradient change which leads to the spontaneous delamination along the normal direction of substrate. In the TiAl/Nb laminated composites alternating overlaid by TiAl of 24 layers and Nb of 23 layers, the interface of each layer evenly distributed throughout the cross-section is transparent, and the interlayer spacing is about 8μm. The component of TiAl layers also changes regularly along the normal direction of substrate, but no delamination phenomenon is found. The TiAl/Nb laminated composites have better ductility than the TiAl-based alloys sheet. 展开更多
关键词 电子束汽相淀积 钛铝基合金板 TiAl/Nb层压复合材料 制备 性质 显微结构
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Influence of Deposition Temperature on the Electrical and Electrochemical Properties of Carbon-Based Coatings for Metallic Bipolar Plates, Prepared by Cathodic Arc Evaporation
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作者 Maximilian Steinhorst Maurizio Giorgio +1 位作者 Teja Roch Christoph Leyens 《Advances in Materials Physics and Chemistry》 2022年第4期47-57,共11页
Cathodic arc evaporation is a well-established physical vapor deposition technique which is characterized by a high degree of ionization and high deposition rate. So far, this technique has been mainly used for the de... Cathodic arc evaporation is a well-established physical vapor deposition technique which is characterized by a high degree of ionization and high deposition rate. So far, this technique has been mainly used for the deposition of tribological coatings. In this study, anti-corrosive and electrical conductive carbon-based coatings with a metallic interlayer were prepared on stainless steel substrates as surface modification for metallic bipolar plates. Hereby, the influence of the deposition temperature during the deposition of the carbon top layer was investigated. Raman spectroscopy revealed differences in the microstructure at 200°C compared to 300°C and 100°C. Measurements of the interfacial contact resistance showed that the deposited coatings significantly improve the electrical conductivity. There are only minor differences between the different carbon top layers. The corrosion resistance of the coatings was studied via potentiodynamic polarization at room temperature and 80°C. Experiments showed that the coating with a carbon top layer deposited at 200°C, considerably reduces the current density and thus corrosion of the substrate is suppressed. 展开更多
关键词 Bipolar Plate CORROSION Interfacial Contact Resistance Carbon Thin Film physical vapor deposition
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PVD技术在聚合物产品表面装饰镀层中的应用研究
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作者 胡佳斌 白旺 《电镀与精饰》 北大核心 2025年第9期97-105,126,共10页
聚合物材料在日用消费品中应用广泛,为满足装饰性需求,采用物理气相沉积(PVD)技术对其进行表面金属化是一种兼具环保与较高性价比的方式。然而,聚合物表面PVD镀层存在结合力差、色彩调控困难等问题。本文综述了PVD技术在聚合物表面装饰... 聚合物材料在日用消费品中应用广泛,为满足装饰性需求,采用物理气相沉积(PVD)技术对其进行表面金属化是一种兼具环保与较高性价比的方式。然而,聚合物表面PVD镀层存在结合力差、色彩调控困难等问题。本文综述了PVD技术在聚合物表面装饰镀层中的研究进展,重点探讨了增强镀层结合力的方法及镀层色彩、质感的调控策略。磁控溅射及其改进工艺是聚合物表面镀层制备的常用方法;通过对基材进行表面活化、表面粗化、中间层制备等方式,可显著提高镀层结合力;调整靶材金属、沉积气氛及工艺参数,可制备不同色彩与质感的镀层。然而,镀层色彩形成机理、特定颜色与装饰效果的制备工艺仍有待深入研究。本综述为聚合物产品表面装饰的理论研究与工程实践提供了参考。 展开更多
关键词 物理气相沉积 聚合物 金属化 表面精饰 装饰镀层
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PVD技术现状及其在汽车内饰件上的应用
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作者 黄庆达 张立新 +2 位作者 郭庆铁 黄庆伟 范文博 《汽车工艺与材料》 2025年第6期46-51,共6页
物理气相沉积(PVD)技术是塑料表面金属化处理的重要手段,总结了蒸发镀、溅射镀和离子镀等PVD技术的概念和特点,阐述了蒸发镀和溅射镀的生产工艺流程及对比塑料电镀的优缺点,介绍了PVD技术在汽车内饰件上的应用情况以及相关试验验证项目... 物理气相沉积(PVD)技术是塑料表面金属化处理的重要手段,总结了蒸发镀、溅射镀和离子镀等PVD技术的概念和特点,阐述了蒸发镀和溅射镀的生产工艺流程及对比塑料电镀的优缺点,介绍了PVD技术在汽车内饰件上的应用情况以及相关试验验证项目,并对PVD的发展趋势进行了总结与展望。 展开更多
关键词 pvd 蒸发镀 溅射镀 汽车内饰
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物理气相沉积(PVD)磁控溅射镀膜着色培育钻石的性能研究
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作者 陈巧 黄诗润 +1 位作者 龚梦蝶 张云浩 《宝石和宝石学杂志(中英文)》 2025年第4期92-98,共7页
近年来,随着培育钻石的技术发展,其生产规模不断扩大。在消费者对彩色钻石需求日益增长的推动下,高质量改色技术亟待发展。本研究团队基于物理气相沉积(PVD)磁控溅射镀膜着色技术,参考合成宝石镀膜着色的成功经验,在培育钻石表面实现了... 近年来,随着培育钻石的技术发展,其生产规模不断扩大。在消费者对彩色钻石需求日益增长的推动下,高质量改色技术亟待发展。本研究团队基于物理气相沉积(PVD)磁控溅射镀膜着色技术,参考合成宝石镀膜着色的成功经验,在培育钻石表面实现了新型镀膜着色处理,并通过工艺调控实现了精准的颜色制备,使得合成莫桑石能够实现“镀色”宝石CIE颜色的色度值精细化,从而可以使2种不同颜色的色差△E低至2.4。针对培育钻石的特殊性,本文通过显微照相、紫外-可见分光光度计、红外-显微红外光谱仪对“镀色”的钻石进行研究分析,并设置控制加热实验和耐腐蚀性实验,对培育钻石颜色的稳定性进行测试。通过对比探究,结果显示,利用磁控溅射镀膜着色技术改色处理后的培育钻石展现出良好的耐高温性和耐腐蚀性,具有优异的耐久性能。本研究希望能为新型镀膜技术的发展进步提供参考,为“镀色”培育钻石的实际应用奠定基础。 展开更多
关键词 物理气相沉积磁控溅射 镀膜着色 培育钻石 光谱学特征
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金属种子层PVD溅射系统在面板级先进封装中的应用
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作者 张晓军 李婷 +3 位作者 胡小波 杨洪生 陈志强 方安安 《电子与封装》 2025年第10期1-8,共8页
物理气相沉积(PVD)溅射系统作为面板级先进封装的关键工艺设备之一,其性能直接影响封装质量和可靠性。介绍了应用于大尺寸(510 mm×515 mm及以上)面板级先进封装的溅射系统,该系统配置了多个单元模块,在降低工艺成本的同时实现连续... 物理气相沉积(PVD)溅射系统作为面板级先进封装的关键工艺设备之一,其性能直接影响封装质量和可靠性。介绍了应用于大尺寸(510 mm×515 mm及以上)面板级先进封装的溅射系统,该系统配置了多个单元模块,在降低工艺成本的同时实现连续自动化溅射镀膜生产,自研的大尺寸阴极溅射系统可以有效提高沉积速率,同时提升靶材利用率至50%;自研冷却系统能显著降低基板表面温度,改善翘曲,实现更精细的控制;在510 mm×515 mm尺寸的基板上沉积的Ti、Cu薄膜的非均匀性分别为±3.05%和±2.36%,玻璃基板表面Ti/Cu薄膜附着力测试值高达277 N/cm^(2),降低了种子层沉积后脱落的风险,全流程均在真空系统内完成,减少了水汽及颗粒对基板的污染,研究结果为面板级先进封装技术的发展提供了重要的参考和指导。 展开更多
关键词 面板级先进封装 物理气相沉积 种子层 大尺寸平面溅射阴极系统
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