针对在非全互连三维片上网络(3D No C)架构中的硅通孔(TSV)表只存储TSV地址信息,导致网络拥塞的问题,提出了记录表结构。该表不仅可以存储距离路由器最近的4个TSV地址,也可存储相应路由器输入缓存的占用和故障信息。在此基础上,又提出...针对在非全互连三维片上网络(3D No C)架构中的硅通孔(TSV)表只存储TSV地址信息,导致网络拥塞的问题,提出了记录表结构。该表不仅可以存储距离路由器最近的4个TSV地址,也可存储相应路由器输入缓存的占用和故障信息。在此基础上,又提出最短传输路径的自适应单播路由算法。首先,计算当前节点与目的节点的坐标确定数据包的传输方式;其次,检测传输路径是否故障,同时获取端口缓存占用信息;最后,确定最佳的传输端口,传输数据包到邻近路由器。两种网络规模下的实验结果表明,与Elevator-First算法相比,所提算法在平均延时和吞吐率性能指标上有明显的优势,且在网络故障率为50%时,Random和Shuffle流量模型下的丢包率分别为25.5%和29.5%。展开更多
The influence of oxygen partial pressure on the optical properties of NiOx thin films deposited by reactive DC-magnetron sputtering from a nickel metal target in a mixture gas of oxygen and argon was presented. With t...The influence of oxygen partial pressure on the optical properties of NiOx thin films deposited by reactive DC-magnetron sputtering from a nickel metal target in a mixture gas of oxygen and argon was presented. With the oxygen ratio increasing, the reflectivity of the as-deposited films decreased, and optical band gap increased. Thermogravimetric analysis （TGA） showed that the decompose temperature of the films was above 250℃. After annealed at 400℃, only films deposited at 5% O2/Ar ratio showed high optical contrast which was about 52%. Scanning electron microscope （SEM） results revealed that the changes of surface morphology were responsible for the optical property variations of the films after annealing. Its thermal stability and high optical contrast before and after annealing made it a good potential write-once optical recording medium. OCIS codes： 310.6860, 310.3840, 210.4810, 300.6470.展开更多
文摘针对在非全互连三维片上网络(3D No C)架构中的硅通孔(TSV)表只存储TSV地址信息,导致网络拥塞的问题,提出了记录表结构。该表不仅可以存储距离路由器最近的4个TSV地址,也可存储相应路由器输入缓存的占用和故障信息。在此基础上,又提出最短传输路径的自适应单播路由算法。首先,计算当前节点与目的节点的坐标确定数据包的传输方式;其次,检测传输路径是否故障,同时获取端口缓存占用信息;最后,确定最佳的传输端口,传输数据包到邻近路由器。两种网络规模下的实验结果表明,与Elevator-First算法相比,所提算法在平均延时和吞吐率性能指标上有明显的优势,且在网络故障率为50%时,Random和Shuffle流量模型下的丢包率分别为25.5%和29.5%。
基金This work is supported by the National High Technology Development Program of China under Grant No.2004AA31G230.
文摘The influence of oxygen partial pressure on the optical properties of NiOx thin films deposited by reactive DC-magnetron sputtering from a nickel metal target in a mixture gas of oxygen and argon was presented. With the oxygen ratio increasing, the reflectivity of the as-deposited films decreased, and optical band gap increased. Thermogravimetric analysis （TGA） showed that the decompose temperature of the films was above 250℃. After annealed at 400℃, only films deposited at 5% O2/Ar ratio showed high optical contrast which was about 52%. Scanning electron microscope （SEM） results revealed that the changes of surface morphology were responsible for the optical property variations of the films after annealing. Its thermal stability and high optical contrast before and after annealing made it a good potential write-once optical recording medium. OCIS codes： 310.6860, 310.3840, 210.4810, 300.6470.
