Wire arc additive manufacturing(WAAM)has emerged as a promising approach for fabricating large-scale components.However,conventional WAAM still faces challenges in optimizing microstructural evolution,minimizing addit...Wire arc additive manufacturing(WAAM)has emerged as a promising approach for fabricating large-scale components.However,conventional WAAM still faces challenges in optimizing microstructural evolution,minimizing additive-induced defects,and alleviating residual stress and deformation,all of which are critical for enhancing the mechanical performance of the manufactured parts.Integrating interlayer friction stir processing(FSP)into WAAM significantly enhances the quality of deposited materials.However,numerical simulation research focusing on elucidating the associated thermomechanical coupling mechanisms remains insufficient.A comprehensive numerical model was developed to simulate the thermomechanical coupling behavior in friction stir-assisted WAAM.The influence of post-deposition FSP on the coupled thermomechanical response of the WAAM process was analyzed quantitatively.Moreover,the residual stress distribution and deformation behavior under both single-layer and multilayer deposition conditions were investigated.Thermal analysis of different deposition layers in WAAM and friction stir-assisted WAAM was conducted.Results show that subsequent layer deposition induces partial remelting of the previously solidified layer,whereas FSP does not cause such remelting.Furthermore,thermal stress and deformation analysis confirm that interlayer FSP effectively mitigates residual stresses and distortion in WAAM components,thereby improving their structural integrity and mechanical properties.展开更多
Multi-electrodes Resistivity Imaging Survey(MRIS)is an array method of electrical survey.In practice how to choose a reasonable array is the key to get reliable survey results.Based on four methods of MRIS such as Wen...Multi-electrodes Resistivity Imaging Survey(MRIS)is an array method of electrical survey.In practice how to choose a reasonable array is the key to get reliable survey results.Based on four methods of MRIS such as Wenner,Schlumberger,Pole-pole and Dipole-dipole the authors established the model,by studying the result of the forward numerical simulation modeling and inverse modeling,and analyzed the differences among the different forms of detection devices.展开更多
为探讨ARC菌肥对提高花生产量和降镉的可能性,本研究以阜花40为试验材料,采用小区试验,以单独施用复合肥为对照,分析ARC菌肥不同施用量对花生产量和降镉效果的影响。结果表明,随着ARC微生物菌肥施用量的增加,花生产量增幅15.84%~25.31%,...为探讨ARC菌肥对提高花生产量和降镉的可能性,本研究以阜花40为试验材料,采用小区试验,以单独施用复合肥为对照,分析ARC菌肥不同施用量对花生产量和降镉效果的影响。结果表明,随着ARC微生物菌肥施用量的增加,花生产量增幅15.84%~25.31%,且A3(每亩施用6 kg ARC菌肥)和A4(每亩施用8 kg ARC菌肥)处理产量最高,但两处理间差异不显著。在花生籽仁镉含量的测定中发现,A3和A4处理降镉效果最好,但2处理间差异不显著。综上所述,A3处理是本试验条件下兼顾花生产量提升和降镉效果的最优处理方案,该处理不仅能够有效提高花生产量,还能显著降低花生籽仁镉含量,达到理想的降镉效果,同时在成本控制方面具有明显优势,适合在花生生产中推广应用。展开更多
This supplemental material contains three sections:(Ⅰ)Derivation of the Floquet lattice Hamiltonian;(Ⅱ)Surface states of the Floquet lattice Hamiltonian;(Ⅲ)Evolution of Floquet Weyl points and Fermi arcs with the i...This supplemental material contains three sections:(Ⅰ)Derivation of the Floquet lattice Hamiltonian;(Ⅱ)Surface states of the Floquet lattice Hamiltonian;(Ⅲ)Evolution of Floquet Weyl points and Fermi arcs with the increase of light amplitude;(Ⅳ)Formalism for light-induced anomalous Hall effects.展开更多
基金National Key Research and Development Program of China(2022YFB4600902)Shandong Provincial Science Foundation for Outstanding Young Scholars(ZR2024YQ020)。
文摘Wire arc additive manufacturing(WAAM)has emerged as a promising approach for fabricating large-scale components.However,conventional WAAM still faces challenges in optimizing microstructural evolution,minimizing additive-induced defects,and alleviating residual stress and deformation,all of which are critical for enhancing the mechanical performance of the manufactured parts.Integrating interlayer friction stir processing(FSP)into WAAM significantly enhances the quality of deposited materials.However,numerical simulation research focusing on elucidating the associated thermomechanical coupling mechanisms remains insufficient.A comprehensive numerical model was developed to simulate the thermomechanical coupling behavior in friction stir-assisted WAAM.The influence of post-deposition FSP on the coupled thermomechanical response of the WAAM process was analyzed quantitatively.Moreover,the residual stress distribution and deformation behavior under both single-layer and multilayer deposition conditions were investigated.Thermal analysis of different deposition layers in WAAM and friction stir-assisted WAAM was conducted.Results show that subsequent layer deposition induces partial remelting of the previously solidified layer,whereas FSP does not cause such remelting.Furthermore,thermal stress and deformation analysis confirm that interlayer FSP effectively mitigates residual stresses and distortion in WAAM components,thereby improving their structural integrity and mechanical properties.
基金Supported by Project of the National High Technology Research and Development Program of China(No.2007AA06Z215)
文摘Multi-electrodes Resistivity Imaging Survey(MRIS)is an array method of electrical survey.In practice how to choose a reasonable array is the key to get reliable survey results.Based on four methods of MRIS such as Wenner,Schlumberger,Pole-pole and Dipole-dipole the authors established the model,by studying the result of the forward numerical simulation modeling and inverse modeling,and analyzed the differences among the different forms of detection devices.
文摘为探讨ARC菌肥对提高花生产量和降镉的可能性,本研究以阜花40为试验材料,采用小区试验,以单独施用复合肥为对照,分析ARC菌肥不同施用量对花生产量和降镉效果的影响。结果表明,随着ARC微生物菌肥施用量的增加,花生产量增幅15.84%~25.31%,且A3(每亩施用6 kg ARC菌肥)和A4(每亩施用8 kg ARC菌肥)处理产量最高,但两处理间差异不显著。在花生籽仁镉含量的测定中发现,A3和A4处理降镉效果最好,但2处理间差异不显著。综上所述,A3处理是本试验条件下兼顾花生产量提升和降镉效果的最优处理方案,该处理不仅能够有效提高花生产量,还能显著降低花生籽仁镉含量,达到理想的降镉效果,同时在成本控制方面具有明显优势,适合在花生生产中推广应用。
文摘This supplemental material contains three sections:(Ⅰ)Derivation of the Floquet lattice Hamiltonian;(Ⅱ)Surface states of the Floquet lattice Hamiltonian;(Ⅲ)Evolution of Floquet Weyl points and Fermi arcs with the increase of light amplitude;(Ⅳ)Formalism for light-induced anomalous Hall effects.
