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Research on deposition rate of TiZrV/Pd film by DC magnetron sputtering method 被引量:2
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作者 Jie Wang Bo Zhang +1 位作者 Yan-Hui Xu Yong Wang 《Nuclear Science and Techniques》 SCIE CAS CSCD 2017年第4期44-50,共7页
An accelerator storage ring needs clean ultrahigh vacuum.A TiZrV non-evaporable getter(NEG) film deposited on interior walls of the chamber can realize distributed pumping,effective vacuum improvement and reduced long... An accelerator storage ring needs clean ultrahigh vacuum.A TiZrV non-evaporable getter(NEG) film deposited on interior walls of the chamber can realize distributed pumping,effective vacuum improvement and reduced longitudinal pressure gradient.But accumulation of pollutants such as N_2 and O_2 will decrease the adsorption ability of the NEG,leading to a reduction of NEG lifetime.Therefore,an NEG thin film coated with a layer of Pd,which has high diffusion rate and absorption ability for H_2,can extend the service life of NEG and improve the pumping rate of H_2 as well.In this paper,with argon as discharge gas,a magnetron sputtering method is adopted to prepare TiZrV-Pd films in a long straight pipe.By SEM measurement,deposition rates of TiZrV-Pd films are analyzed under different deposition parameters,such as magnetic field strength,gas flow rate,discharge current,discharge voltage and working pressure.By comparing the experimental results with the simulation results based on Sigmund's theory,the Pd deposition rate C can be estimated by the sputtered depth. 展开更多
关键词 TiZrV-Pd DEPOSITION rates MAGNETRON sputtering method Non-evaporable GETTER
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Effects of the ion-beam voltage on the properties of the diamond-like carbon thin film prepared by ion-beam sputtering deposition 被引量:1
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作者 孙鹏 胡明 +4 位作者 张锋 季一勤 刘华松 刘丹丹 冷健 《Chinese Physics B》 SCIE EI CAS CSCD 2015年第6期581-585,共5页
Diamond-like carbon (DLC) thin film is one of the most widely used optical thin films. The fraction of chemical bondings has a great influence on the properties of the DLC film. In this work, DLC thin films are prep... Diamond-like carbon (DLC) thin film is one of the most widely used optical thin films. The fraction of chemical bondings has a great influence on the properties of the DLC film. In this work, DLC thin films are prepared by ion-beam sputtering deposition in Ar and CH4 mixtures with graphite as the target. The influences of the ion-beam voltage on the surface morphology, chemical structure, mechanical and infrared optical properties of the DLC films are investigated by atomic force microscopy (AFM), Raman spectroscopy, nanoindentation, and Fourier transform infrared (FTIR) spec- troscopy, respectively. The results show that the surface of the film is uniform and smooth. The film contains sp2 and sp3 hybridized carbon bondings. The film prepared by lower ion beam voltage has a higher sp3 bonding content. It is found that the hardness of DLC films increases with reducing ion-beam voltage, which can be attributed to an increase in the fraction of sp3 carbon bondings in the DLC film. The optical constants can be obtained by the whole infrared optical spectrum fitting with the transmittance spectrum. The refractive index increases with the decrease of the ion-beam voltage, while the extinction coefficient decreases. 展开更多
关键词 DLC thin film ion-beam sputtering deposition chemical bondings infrared optical and mechani-cal properties
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Characterization of La-doped xBiInO_3(1-x)PbTiO_3 Piezoelectric Films Deposited by the Radio-Frequency Magnetron Sputtering Method 被引量:1
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作者 孙科学 张淑仪 +1 位作者 Kiyotaka Wasa 水修基 《Chinese Physics Letters》 SCIE CAS CSCD 2016年第6期49-52,共4页
La-doped and undoped xBiIn03-(1 - x)PbTi03 (BI-PT) thin films are deposited on (101)SrRuO3/(lOO)Pt/(lO0) MgO substrates by the rf-magnetron sputtering method. The structures of the films are characterized by... La-doped and undoped xBiIn03-(1 - x)PbTi03 (BI-PT) thin films are deposited on (101)SrRuO3/(lOO)Pt/(lO0) MgO substrates by the rf-magnetron sputtering method. The structures of the films are characterized by XRD and SEM, and the results indicate that the thin films are grown with mainly (100) oriented and columnar structures. The ferroelectricity and piezoelectricity of the BI-PT films are also measured, and the measured results illustrate that both performances are effectively improved by the La-doping with suitable concentrations. These results will open up wide potential applications of the films in electronic devices. 展开更多
关键词 of BI Characterization of La-doped xBiInO3 x)PbTiO3 Piezoelectric Films Deposited by the Radio-Frequency Magnetron sputtering method in by La PT
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High Ferroelectricities and High Curie Temperature of BiInO3PbTiO3Thin Films Deposited by RF Magnetron Sputtering Method
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作者 孙科学 张淑仪 Kiyotaka Wasa 《Chinese Physics Letters》 SCIE CAS CSCD 2018年第12期19-22,共4页
Properties of ferroelectric xBiInO3-(1-x)PbTiO3(xBI-(1-x)PT) thin films deposited on(101) SrRuO3/(200)Pt/(200) MgO substrates by rf magnetron sputtering method and effects of deposition conditions are inve... Properties of ferroelectric xBiInO3-(1-x)PbTiO3(xBI-(1-x)PT) thin films deposited on(101) SrRuO3/(200)Pt/(200) MgO substrates by rf magnetron sputtering method and effects of deposition conditions are investigated.The structures of the xBI-(1-x)PT films are characterized by x-ray diffraction and scanning electron microscopy.The results indicate that the thin films are grown with mainly(001) orientation. The chemical compositions of the films are analyzed by scanning electron probe and the results indicate that the loss phenomena of Pb and Bi elements depend on the pressure and temperature during the sputtering process.The sputtering parameters including target composition, substrate temperature, and gas pressure are adjusted to obtain optimum sputtering conditions. To decrease leakage currents,2 mol% La2 O3 is doped in the targets. The P-E hysteresis loops show that the optimized xBI-(1-x)PT(x = 0.24) film has high ferroelectricities with remnant polarization2 Pr = 80μC/cm2 and coercive electric field 2 EC = 300 kV/cm. The Curie temperature is about 640℃. The results show that the films have optimum performance and will have wide applications. 展开更多
关键词 In Pb MGO High Ferroelectricities and High Curie Temperature of BiInO3PbTiO3Thin Films Deposited by RF Magnetron sputtering method
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Effects of RF-Sputtering Method Based Oxygen Flow Rate Change on the Properties of ZrO2 Thin Film
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作者 Jin Jeong Kyung-Choul Baek Bong-Ju Lee 《材料科学与工程(中英文A版)》 2012年第3期341-345,共5页
关键词 ZRO2薄膜 射频溅射法 薄膜性能 氧气流量 汇率 薄膜生长 氧分压 氧气分压
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Sputtering Preparation and Magneto-optical Properties of GdTbFeCo Thin Films
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作者 黄致新 《Journal of Wuhan University of Technology(Materials Science)》 SCIE EI CAS 2012年第2期195-198,共4页
Amorphous GdTbFeCo magnetic thin films were successfully prepared on glass substrates by RF magnetron sputtering system from a mosaic target. The influences of sputtering parameters on the magneto- optical properties ... Amorphous GdTbFeCo magnetic thin films were successfully prepared on glass substrates by RF magnetron sputtering system from a mosaic target. The influences of sputtering parameters on the magneto- optical properties GdTbFeCo thin film were investigated by the variable control method. And the influence mechanism was analyzed in detail. After the sputtering parameters were optimized, it was found that when the distance between target and substrate was 72 ram, the thin film thickness was 120 nm, and the sputtering power, sputtering pressure and sputtering time was 75 W, 0.5 Pa and 613 s, respectively, the coercivity with perpendicular anisotropy could be as high as 6735 Oe, and the squareness ratio of the hysteresis loop was almost equal to 1. 展开更多
关键词 influence magnetron sputtering parameters GdTbFeCo thin film magnetoopticalproperty variable control method
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Continuous compositional spread investigation of SiC-based thin films prepared by MW-ECR plasma enhanced magnetron co-sputtering
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作者 Hanghang WANG Liyan ZHANG +1 位作者 Wenqi LU Jun XU 《Plasma Science and Technology》 SCIE EI CAS CSCD 2020年第3期66-70,共5页
A kind of combinatorial material methodology,also known as continuous compositional spread method,was employed to investigate the relationship between the optical band gap and composition of SiC thin films.A wide rang... A kind of combinatorial material methodology,also known as continuous compositional spread method,was employed to investigate the relationship between the optical band gap and composition of SiC thin films.A wide range of SixCy thin films with different carbon contents have been successfully deposited in a single deposition by carefully arranging the sample position on the substrate holder.The films were characterized by surface profiler,x-ray photoelectron spectroscopy,ultraviolet-visible spectroscopy,fourier transform infrared spectroscopy and Raman spectroscopy.The carbon content y increases linearly from 0.28 to 0.72 while the sample position changed from 85 to 175 mm,the optical band gap changed between 1.27 and 1.99 eV,the maximum value corresponded to the stoichiometric SiC sample at the position of 130 mm,which has the highest Si?C bond density of 11.7×10^22 cm^-3.The C poor and C rich SixCy samples with y value less and larger than 0.5 were obtained while samples deviated from the position 130 mm,the optical band gap decreased with the Si?C bond density. 展开更多
关键词 CONTINUOUS compositional SPREAD method silicon CARBIDE optical band gap magnetron sputtering RAMAN and IR spectra
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Damascene Array Structure of Phase Change Memory Fabricated with Chemical Mechanical Polishing Method 被引量:1
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作者 刘奇斌 宋志棠 +3 位作者 张楷亮 王良咏 封松林 CHEN Bomy 《Chinese Physics Letters》 SCIE CAS CSCD 2006年第8期2296-2298,共3页
A damascene structure of phase change memory (PCM) is fabricated successfully with the chemical mechanical polishing (CMP) method, and the CMP of Ge2Sb2Te5 (GST) and Ti films is investigated. The polished surfac... A damascene structure of phase change memory (PCM) is fabricated successfully with the chemical mechanical polishing (CMP) method, and the CMP of Ge2Sb2Te5 (GST) and Ti films is investigated. The polished surface of wafer is analysed by scanning electron microscopy (SEM) and an energy dispersive spectrometer (EDS). The measurements show that the damascene device structure of phase change memory is achieved by the CMP process. After the top electrode is deposited, dc sweeping test on PCM reveals that the phase change can be observed. The threshold current of array cells varies between 0.90mA and 1.15mA. 展开更多
关键词 ion-beam method CELL-ELEMENT
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Studies on Ion-Beam Modified Hydrogen Evolution Electrodes
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作者 Zhang Ji-shuang Li Qin-lian Lu Yao-jiao and Yan Xi-yun (Department of Chemistry and Chemical Engineering, Hunan Univesity, Changsha, 410082) Hou Rang-kun (Deaprtment of Chemistiy , Henan Educational College, Zhengzhou, 450003 ) 《Chemical Research in Chinese Universities》 SCIE CAS CSCD 1994年第2期68-71,共4页
he present paper focuses on the modifying effects of ion beam mixing, ion im-planting and ion sputtering on hydrogen evolution electrodes. It was discovered thatthe four types of electrodes possessed excellent catalyt... he present paper focuses on the modifying effects of ion beam mixing, ion im-planting and ion sputtering on hydrogen evolution electrodes. It was discovered thatthe four types of electrodes possessed excellent catalytic activity in acid or alkalinemedia and potential stability in long term electrolysis of water under high currentdensity. Their stability and applying life-span greatly surpass those of other elec-trodes activated by electrodepositing and other method. The effects of temperatureand roughness on function of electrodes were also examined. XPS and AES wereapplied to analyse the surface composition and bond states of the electrodes, andthe distribution of concentration varying with depth, and to explain the law of theexperiments . 展开更多
关键词 Implantating ion-beam Mixing Ion sputtering XPS Hydrogen Evo-lution Reaction
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Characterization of the arrangement feature of copper interconnects by Moir inversion method
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作者 Qinghua Wang Satoshi Kishimoto +2 位作者 Huimin Xie Kewei Xu Jianfeng Wang 《Theoretical & Applied Mechanics Letters》 2012年第2期37-40,共4页
This paper explores the planar arrangement feature of the copper interconnects in a view field of several millimeters by the focused ion-beam (FIB) Moire inversion method quantitatively. The curved FIB Moire pattern... This paper explores the planar arrangement feature of the copper interconnects in a view field of several millimeters by the focused ion-beam (FIB) Moire inversion method quantitatively. The curved FIB Moire patterns indicate that the copper interconnects are a series of curves with continuous variations instead of beelines. The control equation set of the copper interconnects central lines is attained through the Moire inversion method. This work can be extended to inspect the structural defects and provide a reliable support for the interconnects structure fabrication. 展开更多
关键词 copper interconnects arrangement Moire inversion method focused ion-beam
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Si_(3)N_(4)基底TiC薄膜的制备及其摩擦学性能的研究
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作者 王贺 褚健翔 +3 位作者 闫广宇 吴玉厚 陈思博 戴广远 《材料保护》 2025年第8期147-154,共8页
为解决Si_(3)N_(4)陶瓷轴承在使用过程中因其高摩擦系数引起的发热问题,采用磁控溅射法在Si_(3)N_(4)陶瓷轴承表面制备了4种碳含量(原子分数)分别为38.84%、63.90%、69.23%、78.04%的TiC薄膜,研究了薄膜碳含量对薄膜微观结构和性能的影... 为解决Si_(3)N_(4)陶瓷轴承在使用过程中因其高摩擦系数引起的发热问题,采用磁控溅射法在Si_(3)N_(4)陶瓷轴承表面制备了4种碳含量(原子分数)分别为38.84%、63.90%、69.23%、78.04%的TiC薄膜,研究了薄膜碳含量对薄膜微观结构和性能的影响;利用扫描电子显微镜(SEM)、X射线衍射仪(XRD)分析薄膜的表面、截面形貌及薄膜成分;利用纳米划痕实验、摩擦磨损实验分析薄膜的膜基结合力及摩擦学性能。结果表明:TiC薄膜拥有无定形碳包裹着晶粒的结构;随着碳元素含量的增加,TiC薄膜显示出(111)择优取向生长趋势并慢慢转变为无明显择优取向生长;当碳含量为63.90%(原子分数)时,TiC薄膜拥有最高的膜基结合力26.22 N。与Si_(3)N_(4)的摩擦系数0.419相比,当碳含量为78.04%(原子分数)时,TiC薄膜拥有比Si_(3)N_(4)基底更低的摩擦系数0.047;在Si_(3)N_(4)陶瓷轴承表面制备TiC薄膜可以有效提高结合力并降低摩擦系数。 展开更多
关键词 磁控溅射法 TiC薄膜 Si_(3)N_(4)基底 碳含量 膜基结合力 摩擦学性能
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基于裂纹模板法的双层金属网格透明导电薄膜制备及性能
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作者 廖敦微 周建华 郑月军 《物理学报》 北大核心 2025年第1期133-142,共10页
在裂纹模板法制备单层金属网格透明导电薄膜的基础上,为提升其电磁屏蔽性能,制备了双层金属网格透明导电薄膜.通过旋涂法和提拉法工艺分别得到双层裂纹模板后,进而制备相应的双层金属网格透明导电薄膜.首先对同样条件下采用旋涂法制备... 在裂纹模板法制备单层金属网格透明导电薄膜的基础上,为提升其电磁屏蔽性能,制备了双层金属网格透明导电薄膜.通过旋涂法和提拉法工艺分别得到双层裂纹模板后,进而制备相应的双层金属网格透明导电薄膜.首先对同样条件下采用旋涂法制备的单层和双层金属网格透明导电薄膜样品进行性能测试和对比,可知双层结构相对于单层的透光率下降了10.9%,在Ku波段(12-18 GHz)测试的电磁屏蔽效能提升了30 dB.另外,对提拉法制备的双层金属网格样品也进行了测试,与同样条件制备的单层金属网格样品相比,双层结构在损失8.38%的透光率前提下,在Ku波段的电磁屏蔽效能提升了20 dB.测试结果表明,制备的双层金属网格透明导电薄膜在牺牲一定透光性能前提下可明显提升电磁屏蔽性能.通过对基于裂纹模板法的双层金属网格透明导电薄膜的制备和性能研究,可以充分利用裂纹模板法工艺的低成本优势制备高电磁屏蔽性能的双层金属网格透明导电薄膜. 展开更多
关键词 裂纹模板法 双层金属网格透明导电薄膜 高电磁屏蔽性能 磁控溅射
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磁控溅射沉积不同膜结构TiN薄膜对Si_(3)N_(4)基底的耐磨性能改善研究
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作者 王贺 陈思博 +3 位作者 闫广宇 吴玉厚 褚健翔 戴广远 《材料保护》 2025年第7期85-95,共11页
为解决氮化硅陶瓷轴承在极端工况下表面易受磨损的问题,采用磁控溅射法在氮化硅基底上制备梯度、多层和单层TiN薄膜。选用3种氮气供给模式:以15 mL/min为初始流量,每5 min N_(2)流量递增0.8 mL/min、交替开关N_(2)流量0+30 mL/min、N_(2... 为解决氮化硅陶瓷轴承在极端工况下表面易受磨损的问题,采用磁控溅射法在氮化硅基底上制备梯度、多层和单层TiN薄膜。选用3种氮气供给模式:以15 mL/min为初始流量,每5 min N_(2)流量递增0.8 mL/min、交替开关N_(2)流量0+30 mL/min、N_(2)恒流30 mL/min。采用XRD衍射仪、扫描电子显微镜研究薄膜结构对薄膜表面、截面形貌和微观结构的影响,通过划痕和摩擦磨损试验检测薄膜的膜基结合力和摩擦磨损性能。结果显示:在相同试验条件下,梯度TiN薄膜拥有最高的膜基结合力(L_(C2)为19.12 N),比单层TiN薄膜提高约0.3倍,与氮化硅的摩擦系数(0.78)和磨损率[1.51×10^(-5)mm^(3)/(m·N)]相比,不同膜结构的TiN薄膜的摩擦系数和磨损率均有明显下降,梯度TiN薄膜拥有最低的摩擦系数(0.10)和最低的磨损率[3.33×10^(-6)mm^(3)/(m·N)]。不同膜结构设计显著影响TiN薄膜的微观结构、膜基结合力和摩擦学性能,摩擦学性能最好的膜结构为梯度TiN薄膜结构。 展开更多
关键词 磁控溅射法 Si_(3)N_(4)基底 TIN薄膜 膜基结合力 摩擦学性能
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基于PIC-MCC方法的溅射离子泵抽速计算方法
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作者 王耀之 刘奕新 +1 位作者 张华鹏 张志军 《真空与低温》 2025年第3期405-411,共7页
基于溅射离子泵潘宁放电单元的实际工作条件,采用PIC-MCC方法建立了相应的仿真模型,并利用开源代码picFoam对单个潘宁放电单元进行了模拟分析。结合仿真结果与现有理论,通过计算离子入射参数,得到了溅射出的钛原子数量,并进一步结合阳... 基于溅射离子泵潘宁放电单元的实际工作条件,采用PIC-MCC方法建立了相应的仿真模型,并利用开源代码picFoam对单个潘宁放电单元进行了模拟分析。结合仿真结果与现有理论,通过计算离子入射参数,得到了溅射出的钛原子数量,并进一步结合阳极筒参数计算单个潘宁放电单元的抽速和溅射离子泵的整体抽速。分析了不同工作压力下离子的入射位置、入射能量及入射角度的分布规律,计算了单个潘宁放电单元的抽速。最终,基于阳极筒的排列方式得出溅射离子泵的整体抽速,计算结果与理论值对比显示出良好的一致性。 展开更多
关键词 溅射离子泵 PIC-MCC方法 潘宁放电 入射参数 抽速计算
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绿色节能低辐射(Low-E)玻璃的技术发展历程及其展望
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作者 张进康 杨晓林 +3 位作者 孔德茹 赵新臣 刘靖 孙冬兰 《绿色建筑》 2025年第5期40-48,共9页
Low-E玻璃是一种表面涂有特殊镀膜的玻璃材料,可以有效阻隔太阳光中红外线的辐射热并且透过可见光,减少热量传输,具有保温、节能、高效的特点。系统性地回顾了Low-E玻璃的发展历程,浅析了当前其在我国建筑等领域中的地位,并对Low-E玻璃... Low-E玻璃是一种表面涂有特殊镀膜的玻璃材料,可以有效阻隔太阳光中红外线的辐射热并且透过可见光,减少热量传输,具有保温、节能、高效的特点。系统性地回顾了Low-E玻璃的发展历程,浅析了当前其在我国建筑等领域中的地位,并对Low-E玻璃节能原理、种类与技术特点,包括单银、双银和三银Low-E膜层的性能差异和各种制备工艺的特点进行综合概述。最后,结合我国现行的相关政策和法规,分析了Low-E玻璃在我国的市场状况和未来发展潜力。不仅为Low-E玻璃行业提供了技术总结及展望,也为建筑行业、政策制定者和市场分析师提供了借鉴,具有较好的研究价值和实际应用意义。 展开更多
关键词 低辐射玻璃 保温 隔热 银层 磁控溅射法 节能
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Robust ferroelectricity in ultrathin BaTiO_(3)films deposited at room temperature
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作者 Cong-Meng Li Hui Li +2 位作者 Jian Chen Ming-Kai Li Hong-Wei Gu 《Rare Metals》 2025年第7期5106-5111,共6页
Ferroelectric materials are widely applied in the ferroelectronic devices,photovoltaics,and so on.Ultrathin ferroelectric thin films are highly desired for their applications,which still remain a challenge.In this wor... Ferroelectric materials are widely applied in the ferroelectronic devices,photovoltaics,and so on.Ultrathin ferroelectric thin films are highly desired for their applications,which still remain a challenge.In this work,the ultrathin barium titanate(BaTiO_(3),BTO)films are deposited directly on the fluorine-doped tin oxide glass(SnO_(2):F,FTO)substrates by radio frequency magnetron sputtering method at different temperatures.All BTO ultrathin films exhibit strong ferroelectric properties.Interestingly,BTO thin films deposited at room temperature(RT)also exhibit robust ferroelectricity.The polar domains are switched reversibly with a phase degree of~180°by piezoelectric force microscopy for the BTO thin films deposited at room temperature,attributing to the strain and ion migration. 展开更多
关键词 radio frequency magnetron sputtering method barium titanate batio bto films ferroelectronic devicesphotovoltaicsand ferroelectric propertiesinterestinglybto ferroelectric materials ultrathin films ferroelectric thin films barium titanate
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Pt界面层对SiC_(f)/SiC复合材料力学和电磁屏蔽性能的影响
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作者 姜葳 郁荣 +3 位作者 潘海军 邓沛琳 段士昌 杨博 《陶瓷学报》 北大核心 2025年第4期796-804,共9页
SiC_(f)/SiC复合材料因具有电磁参数连续可调的特点,适用于电磁屏蔽领域。贵金属铂具有优异的导电性能,能有效反射电磁波,引入复合材料内部能够调控其电磁参数从而影响电磁屏蔽效果。采用磁控溅射工艺可实现Pt界面层均匀沉积在纤维束表... SiC_(f)/SiC复合材料因具有电磁参数连续可调的特点,适用于电磁屏蔽领域。贵金属铂具有优异的导电性能,能有效反射电磁波,引入复合材料内部能够调控其电磁参数从而影响电磁屏蔽效果。采用磁控溅射工艺可实现Pt界面层均匀沉积在纤维束表面,厚度均匀可控。随着界面层厚度的增加,复合材料的弯曲强度和电磁屏蔽性能均呈现出先增加后降低的变化趋势,在界面层厚度为150 nm时,复合材料的弯曲强度均值达到425 MPa,相较无界面层复合材料提升了32%,在10 GHz的电磁屏蔽性能从16 dB提升至32 dB,增加了一倍,主要原因是Pt界面层的引入显著提高了复合材料的强度和介电常数虚部,使得其弯曲性能和电磁屏蔽性能均得到显著提升。 展开更多
关键词 Pt界面层 SICF/SIC复合材料 电磁屏蔽性能 磁控溅射法
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The influence of sequence of precursor films on CZTSe thin films prepared by ion-beam sputtering deposition
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作者 Jun Zhao Guangxing Liang +4 位作者 Yang Zeng Ping Fan Juguang Hu Jingting Luo Dongping Zhang 《Journal of Semiconductors》 EI CAS CSCD 2017年第2期15-19,共5页
The CuZnSn(CZT) precursor thin films are grown by ion-beam sputtering Cu, Zn, Sn targets with different orders and then sputtering Se target to fabricate Cu_2ZnSnSe_4(CZTSe) absorber thin films on molybdenum subst... The CuZnSn(CZT) precursor thin films are grown by ion-beam sputtering Cu, Zn, Sn targets with different orders and then sputtering Se target to fabricate Cu_2ZnSnSe_4(CZTSe) absorber thin films on molybdenum substrates. They are annealed in the same vacuum chamber at 400 ℃. The characterization methods of CZTSe thin films include X-ray diffraction(XRD), energy dispersive spectroscopy(EDS), scanning electron microscopy(SEM), and X-ray photoelectron spectra(XPS) in order to study the crystallographic properties, composition, surface morphology, electrical properties and so on. The results display that the CZTSe thin films got the strongest diffraction peak intensity and were with good crystalline quality and its morphology appeared smooth and compact with a sequence of Cu/Zn/Sn/Se, which reveals that the expected states for CZTSe are Cu^(1+), Zn^(2+), Sn^(4+), Se^(2).With the good crystalline quality and close to ideal stoichiometric ratio the resistivity of the CZTSe film with the sequence of Cu/Zn/Sn/Se is lower, whose optical band gap is about 1.50 eV. 展开更多
关键词 CZTSe thin films ion-beam sputtering chalcogenide
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硫化钨薄膜制备方法的研究 被引量:9
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作者 巴德纯 杜广煜 王晓光 《真空科学与技术学报》 EI CAS CSCD 北大核心 2009年第1期73-77,共5页
层状物固体润滑薄膜是固体润滑薄膜中最常用的形式,这种薄膜都具有优良的减摩、耐磨、抗擦伤性能。本文介绍了目前主要的硫化钨薄膜的制备方法,并通过射频溅射方法和硫化法制备了硫化钨薄膜,对各种制备方法进行了对比。通过溅射方法获... 层状物固体润滑薄膜是固体润滑薄膜中最常用的形式,这种薄膜都具有优良的减摩、耐磨、抗擦伤性能。本文介绍了目前主要的硫化钨薄膜的制备方法,并通过射频溅射方法和硫化法制备了硫化钨薄膜,对各种制备方法进行了对比。通过溅射方法获得的硫化钨薄膜的化学成分会随工作压力和溅射功率发生变化,同时薄膜的结晶率不高,而非晶态WS2薄膜的摩擦性能具有不确定性。但目前溅射方法仍是固态硫化钨薄膜最主要的制备方法。而通过硫化WO3薄膜获得的WS2薄膜,可以通过调整硫化温度和保温时间来获得具有较好的结晶性和有利的晶粒取向,从而提高薄膜的摩擦学性能。通过这种方法获得的WS2薄膜的一些其它性能,尚需作进一步研究。 展开更多
关键词 二硫化钨 制备方法 磁控溅射 射频溅射 硫化法
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平面磁控溅射靶磁场的计算 被引量:11
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作者 赵华玉 牟宗信 +2 位作者 贾莉 张鹏云 郝胜智 《真空科学与技术学报》 EI CAS CSCD 北大核心 2008年第3期271-274,共4页
精确分析磁控靶的磁场对优化磁控靶的设计非常重要。本文采用有限元法分析了圆形平面磁控靶的二维磁场分布,理论计算的结果与特斯拉计的实验测量相符,通过对比两种不同磁极尺寸的磁控靶的磁场,发现减少磁极的尺寸可以扩展靶表面径向磁... 精确分析磁控靶的磁场对优化磁控靶的设计非常重要。本文采用有限元法分析了圆形平面磁控靶的二维磁场分布,理论计算的结果与特斯拉计的实验测量相符,通过对比两种不同磁极尺寸的磁控靶的磁场,发现减少磁极的尺寸可以扩展靶表面径向磁场区域,磁芯上方加圆锥形极靴可以增强磁芯上方径向磁场。 展开更多
关键词 磁控溅射 磁场 有限元法
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