In this issue of Journal of Biomedical Research,3review articles are published that cover a broad range of topics addressing current understanding on regulation of nutrient metabolism through protein phosphatases,home...In this issue of Journal of Biomedical Research,3review articles are published that cover a broad range of topics addressing current understanding on regulation of nutrient metabolism through protein phosphatases,homeostatic regulation of cellular lipid droplets by small GTPases,and mechanisms by which hepatic assembly and secretion of triglyceride-rich lipoproteins are regulated.展开更多
Analysis approach and formulas for the transmission properties of uniform multicon-ductor interconnecting buses in high-speed integrated circuits are presented in this article. And further, by using a network approach...Analysis approach and formulas for the transmission properties of uniform multicon-ductor interconnecting buses in high-speed integrated circuits are presented in this article. And further, by using a network approach, a tapered bus system can be analyzed as a set of cascaded uniform buses with slightly different strip widths. Obtained results are in good agreement with the experimental data.展开更多
The interconnect temperature of very large scale integration（VLSI） circuits keeps rising due to self-heating and substrate temperature, which can increase the delay and power dissipation of interconnect wires. The t...The interconnect temperature of very large scale integration（VLSI） circuits keeps rising due to self-heating and substrate temperature, which can increase the delay and power dissipation of interconnect wires. The thermal vias are regarded as a promising method to improve the temperature performance of VLSI circuits. In this paper, the extra thermal vias were used to decrease the delay and power dissipation of interconnect wires of VLSI circuits. Two analytical models were presented for interconnect temperature, delay and power dissipation with adding extra dummy thermal vias. The influence of the number of thermal vias on the delay and power dissipation of interconnect wires was analyzed and the optimal via separation distance was investigated. The experimental results show that the adding extra dummy thermal vias can reduce the interconnect average temperature, maximum temperature, delay and power dissipation. Moreover, this method is also suitable for clock signal wires with a large root mean square current.展开更多
Interconnect reliability has been regarded as a discipline that must be seriously taken into account from the early design phase of integrated circuit (IC). In order to study the status and trend of the interconnect r...Interconnect reliability has been regarded as a discipline that must be seriously taken into account from the early design phase of integrated circuit (IC). In order to study the status and trend of the interconnect reliability, a comprehensive review of the published literatures is carried out. This can depict the global trend of ICs’ interconnect reliability and help the new entrants to understand the present situation of this area.展开更多
As the feature size of the CMOS integrated circuit continues to shrink, the more and more serious scattering effect has a serious impact on interconnection performance, such as delay and bandwidth. Based on the impact...As the feature size of the CMOS integrated circuit continues to shrink, the more and more serious scattering effect has a serious impact on interconnection performance, such as delay and bandwidth. Based on the impact of the scattering effect on latency and bandwidth, this paper first presents the quality-factor model which optimises latency and bandwidth effectively with the consideration of the scattering effect. Then we obtain the analytical model of line width and spacing with application of curve-fitting method. The proposed model has been verified and compared based on the nano-scale CMOS technology. This optimisation model algorithm is simple and can be applied to the interconnection system optimal design of nano-scale integrated circuits.展开更多
A new transient analysis method for the transmission line circuits is presented in this paper. Based on the semidiscretization of the telegraph equations, a discretized time domain companion models for the transmissio...A new transient analysis method for the transmission line circuits is presented in this paper. Based on the semidiscretization of the telegraph equations, a discretized time domain companion models for the transmission lines which can be conveniently implemented in a general circuit simulator such as SPICE is derived. The computation required for the model is linear with time, equivalent to the recursive convolution-based method. The formulations for both single and coupled lossy transmission lines are given. Numerical experiments are carried out to demonstrate the validity of the method.展开更多
The progress on novel interconnects for carbon nanotube(CNT)-based electronic circuit is by far behind the remarkable development of CNT-field effect transistors.The Cu interconnect material used in current integrated...The progress on novel interconnects for carbon nanotube(CNT)-based electronic circuit is by far behind the remarkable development of CNT-field effect transistors.The Cu interconnect material used in current integrated circuits seems not applicable for the novel interconnects,as it requires electrochemical deposition followed by chemical-mechanical polishing.We report our experimental results on the failure current density,resistivity,electromigration effect and failure mechanism of patterned stripes of Pd,Sc and Y thin-films,regarding them as the potential novel interconnects.The Pd stripes have a failure current density of(8~10)×106 A/cm^2(MA/cm^2),and they are stable when the working current density is as much as 90% of the failure current density.However,they show a resistivity around 210 μΩ·cm,which is 20 times of the bulk value and leaving room for improvement.Compared to Pd,the Sc stripes have a similar resistivity but smaller failure current density of 4~5 MA/cm^2.Y stripes seem not suitable for interconnects by showing even lower failure current density than that of Sc and evidence of oxidation.For comparison,Au stripes of the same dimensions show a failure current density of 30 MA/cm^2 and a resistivity around 4 μΩ·cm,making them also a good material as novel interconnects.展开更多
Interconnect power and repeater area are important in the interconnect optimization of nanometer scale integrated circuits. Based on the RLC interconnect delay model, by wire sizing, wire spacing arid adopting low-swi...Interconnect power and repeater area are important in the interconnect optimization of nanometer scale integrated circuits. Based on the RLC interconnect delay model, by wire sizing, wire spacing arid adopting low-swing interconnect technology, this paper proposed a power-area optimization model considering delay and bandwidth constraints simultaneously. The optimized model is verified based on 65-am and 90-nm complementary metal-oxide semiconductor （CMOS） interconnect parameters. The verified results show that averages of 36% of interconnect power and 26% of repeater area can be saved under 65-nm CMOS process. The proposed model is especially suitable for the computer-aided design of nanometer scale systems-on-chip.展开更多
文摘In this issue of Journal of Biomedical Research,3review articles are published that cover a broad range of topics addressing current understanding on regulation of nutrient metabolism through protein phosphatases,homeostatic regulation of cellular lipid droplets by small GTPases,and mechanisms by which hepatic assembly and secretion of triglyceride-rich lipoproteins are regulated.
文摘Analysis approach and formulas for the transmission properties of uniform multicon-ductor interconnecting buses in high-speed integrated circuits are presented in this article. And further, by using a network approach, a tapered bus system can be analyzed as a set of cascaded uniform buses with slightly different strip widths. Obtained results are in good agreement with the experimental data.
基金Supported by the Guangdong Provincial Natural Science Foundation of China(2014A030313441)the Guangzhou Science and Technology Project(201510010169)+1 种基金the Guangdong Province Science and Technology Project(2016B090918071,2014A040401076)the National Natural Science Foundation of China(61072028)
文摘The interconnect temperature of very large scale integration（VLSI） circuits keeps rising due to self-heating and substrate temperature, which can increase the delay and power dissipation of interconnect wires. The thermal vias are regarded as a promising method to improve the temperature performance of VLSI circuits. In this paper, the extra thermal vias were used to decrease the delay and power dissipation of interconnect wires of VLSI circuits. Two analytical models were presented for interconnect temperature, delay and power dissipation with adding extra dummy thermal vias. The influence of the number of thermal vias on the delay and power dissipation of interconnect wires was analyzed and the optimal via separation distance was investigated. The experimental results show that the adding extra dummy thermal vias can reduce the interconnect average temperature, maximum temperature, delay and power dissipation. Moreover, this method is also suitable for clock signal wires with a large root mean square current.
文摘Interconnect reliability has been regarded as a discipline that must be seriously taken into account from the early design phase of integrated circuit (IC). In order to study the status and trend of the interconnect reliability, a comprehensive review of the published literatures is carried out. This can depict the global trend of ICs’ interconnect reliability and help the new entrants to understand the present situation of this area.
基金supported by the National Natural Science Foundation of China (Grant Nos.60725415 and 60971066)the National High-tech Program (Grant Nos.2009AA01Z258 and 2009AA01Z260)the National Key Lab Foundation (Grant No.ZHD200904)
文摘As the feature size of the CMOS integrated circuit continues to shrink, the more and more serious scattering effect has a serious impact on interconnection performance, such as delay and bandwidth. Based on the impact of the scattering effect on latency and bandwidth, this paper first presents the quality-factor model which optimises latency and bandwidth effectively with the consideration of the scattering effect. Then we obtain the analytical model of line width and spacing with application of curve-fitting method. The proposed model has been verified and compared based on the nano-scale CMOS technology. This optimisation model algorithm is simple and can be applied to the interconnection system optimal design of nano-scale integrated circuits.
文摘A new transient analysis method for the transmission line circuits is presented in this paper. Based on the semidiscretization of the telegraph equations, a discretized time domain companion models for the transmission lines which can be conveniently implemented in a general circuit simulator such as SPICE is derived. The computation required for the model is linear with time, equivalent to the recursive convolution-based method. The formulations for both single and coupled lossy transmission lines are given. Numerical experiments are carried out to demonstrate the validity of the method.
基金supported by the NSF China (10774002) and the MOST China (No 2006CB932401)
文摘The progress on novel interconnects for carbon nanotube(CNT)-based electronic circuit is by far behind the remarkable development of CNT-field effect transistors.The Cu interconnect material used in current integrated circuits seems not applicable for the novel interconnects,as it requires electrochemical deposition followed by chemical-mechanical polishing.We report our experimental results on the failure current density,resistivity,electromigration effect and failure mechanism of patterned stripes of Pd,Sc and Y thin-films,regarding them as the potential novel interconnects.The Pd stripes have a failure current density of(8~10)×106 A/cm^2(MA/cm^2),and they are stable when the working current density is as much as 90% of the failure current density.However,they show a resistivity around 210 μΩ·cm,which is 20 times of the bulk value and leaving room for improvement.Compared to Pd,the Sc stripes have a similar resistivity but smaller failure current density of 4~5 MA/cm^2.Y stripes seem not suitable for interconnects by showing even lower failure current density than that of Sc and evidence of oxidation.For comparison,Au stripes of the same dimensions show a failure current density of 30 MA/cm^2 and a resistivity around 4 μΩ·cm,making them also a good material as novel interconnects.
基金Project supported by the National Natural Science Foundation of China (Grant Nos. 60725415 and 60971066)the National High-Tech Program of China (Grant Nos. 2009AA01Z258 and 2009AA01Z260)the National Science & Technology Important Project of China (Grant No. 2009ZX01034-002-001-005)
文摘Interconnect power and repeater area are important in the interconnect optimization of nanometer scale integrated circuits. Based on the RLC interconnect delay model, by wire sizing, wire spacing arid adopting low-swing interconnect technology, this paper proposed a power-area optimization model considering delay and bandwidth constraints simultaneously. The optimized model is verified based on 65-am and 90-nm complementary metal-oxide semiconductor （CMOS） interconnect parameters. The verified results show that averages of 36% of interconnect power and 26% of repeater area can be saved under 65-nm CMOS process. The proposed model is especially suitable for the computer-aided design of nanometer scale systems-on-chip.
