设计一种特别的TiCoSb复合靶材,通过调节各元素在复合靶材上所占面积的大小,可以方便地调节薄膜的成分.采用这种靶材,利用直流磁控溅射和快速退火成功制备单一物相的多晶TiCoSb薄膜;采用X射线衍射(X-raydiffraction,XRD)和原子力显微镜(...设计一种特别的TiCoSb复合靶材,通过调节各元素在复合靶材上所占面积的大小,可以方便地调节薄膜的成分.采用这种靶材,利用直流磁控溅射和快速退火成功制备单一物相的多晶TiCoSb薄膜;采用X射线衍射(X-raydiffraction,XRD)和原子力显微镜(atomic force microscopy,AFM)分析TiCoSb薄膜的结构和表面形貌;利用Hall测试仪初步研究薄膜的电学性质.结果表明,所制备的TiCoSb薄膜对石英玻璃衬底具有良好的粘附力,薄膜均匀致密.经600℃,5 min退火的TiCoSb薄膜的结晶质量较好,薄膜的室温电导率为13.7 S/cm.展开更多
The p-type TiCoSb-based half-Heuslers are widely studied due to the good electrical transport properties after hole doping,while the pristine TiCoSb is intrinsically n-type.It is thus desired to obtain a comparable n-...The p-type TiCoSb-based half-Heuslers are widely studied due to the good electrical transport properties after hole doping,while the pristine TiCoSb is intrinsically n-type.It is thus desired to obtain a comparable n-type counterpart through optimization of electron concentration.In this work,n-type Ti_(0.9-x)HfxTa_(0.1)CoSb half-Heuslers were fabricated by arc melting,ball milling,and spark plasma sintering.An optimized carrier concentration,together with a decreased lattice thermal conductivity,was obtained by Ta doping at the Ti site,leading to a peak figure of merit(ZT)of 0.7 at 973 K in Ti_(0.9)Ta_(0.1)-CoSb.By further alloying Hf at the Ti site,the lattice thermal conductivity was significantly reduced without deteriorating the power factor.As a result,a peak ZT of 0.9 at 973 K and an average ZT of 0.54 in the temperature range of 300-973 K were achieved in Ti_(0.6)Hf_(0.3)Ti_(0.1)CoSb.This work demonstrates that n-type TiCoSb-based halfHeuslers are promising thermoelectric materials.展开更多
文摘设计一种特别的TiCoSb复合靶材,通过调节各元素在复合靶材上所占面积的大小,可以方便地调节薄膜的成分.采用这种靶材,利用直流磁控溅射和快速退火成功制备单一物相的多晶TiCoSb薄膜;采用X射线衍射(X-raydiffraction,XRD)和原子力显微镜(atomic force microscopy,AFM)分析TiCoSb薄膜的结构和表面形貌;利用Hall测试仪初步研究薄膜的电学性质.结果表明,所制备的TiCoSb薄膜对石英玻璃衬底具有良好的粘附力,薄膜均匀致密.经600℃,5 min退火的TiCoSb薄膜的结晶质量较好,薄膜的室温电导率为13.7 S/cm.
基金financially supported by the National Natural Science Foundation of China(Nos.51971081 and 11674078)the Natural Science Foundation for Distinguished Young Scholars of Guangdong Province of China(No.202031515020023)Shenzhen Science and Technology Innovation Plan(No.KQJSCX20180328165435202)。
文摘The p-type TiCoSb-based half-Heuslers are widely studied due to the good electrical transport properties after hole doping,while the pristine TiCoSb is intrinsically n-type.It is thus desired to obtain a comparable n-type counterpart through optimization of electron concentration.In this work,n-type Ti_(0.9-x)HfxTa_(0.1)CoSb half-Heuslers were fabricated by arc melting,ball milling,and spark plasma sintering.An optimized carrier concentration,together with a decreased lattice thermal conductivity,was obtained by Ta doping at the Ti site,leading to a peak figure of merit(ZT)of 0.7 at 973 K in Ti_(0.9)Ta_(0.1)-CoSb.By further alloying Hf at the Ti site,the lattice thermal conductivity was significantly reduced without deteriorating the power factor.As a result,a peak ZT of 0.9 at 973 K and an average ZT of 0.54 in the temperature range of 300-973 K were achieved in Ti_(0.6)Hf_(0.3)Ti_(0.1)CoSb.This work demonstrates that n-type TiCoSb-based halfHeuslers are promising thermoelectric materials.
