A method to measure temporal and spatial evolution of sheath in plasma immersion ion implantation （PIII） process is presented. A long Langmuir probe （Ф5 mm× Ф78 mm） with low bias is used to detect the sheat...A method to measure temporal and spatial evolution of sheath in plasma immersion ion implantation （PIII） process is presented. A long Langmuir probe （Ф5 mm× Ф78 mm） with low bias is used to detect the sheath propagation and backup with time. The substrate made of A1 cylinder （Ф 20 mm×Ф 150 mm） is immersed in nitrogen and argon plasma induced by magnetron self-sustained discharge. The maximum sheath sizes, at different plasma densities under different discharge currents, are measured and compared.展开更多
基金High Energy Density Beam Processing Key Laboratory Foundation of China(No.9140C45020106)
文摘A method to measure temporal and spatial evolution of sheath in plasma immersion ion implantation （PIII） process is presented. A long Langmuir probe （Ф5 mm× Ф78 mm） with low bias is used to detect the sheath propagation and backup with time. The substrate made of A1 cylinder （Ф 20 mm×Ф 150 mm） is immersed in nitrogen and argon plasma induced by magnetron self-sustained discharge. The maximum sheath sizes, at different plasma densities under different discharge currents, are measured and compared.
