摘要
A method to measure temporal and spatial evolution of sheath in plasma immersion ion implantation （PIII） process is presented. A long Langmuir probe （Ф5 mm× Ф78 mm） with low bias is used to detect the sheath propagation and backup with time. The substrate made of A1 cylinder （Ф 20 mm×Ф 150 mm） is immersed in nitrogen and argon plasma induced by magnetron self-sustained discharge. The maximum sheath sizes, at different plasma densities under different discharge currents, are measured and compared.
A method to measure temporal and spatial evolution of sheath in plasma immersion ion implantation （PIII） process is presented. A long Langmuir probe （Ф5 mm× Ф78 mm） with low bias is used to detect the sheath propagation and backup with time. The substrate made of A1 cylinder （Ф 20 mm×Ф 150 mm） is immersed in nitrogen and argon plasma induced by magnetron self-sustained discharge. The maximum sheath sizes, at different plasma densities under different discharge currents, are measured and compared.
基金
High Energy Density Beam Processing Key Laboratory Foundation of China(No.9140C45020106)
