In this study,controllable fabrication of nickel-doped diamond-like carbon(Ni-DLC)films through laser-assisted electrochemical deposition under low-voltage conditions(5 V)is achieved.After substrate polishing,picoseco...In this study,controllable fabrication of nickel-doped diamond-like carbon(Ni-DLC)films through laser-assisted electrochemical deposition under low-voltage conditions(5 V)is achieved.After substrate polishing,picosecond laser irradiation is applied during electrodeposition to precisely control the laser energy and defocus distance during film preparation,with subsequent analysis of surface morphology,composition,and properties in correlation with growth mechanisms.Compared with conventional DLC electrodeposition,the laser-assisted technique significantly improves film quality by maintaining the deposition zone temperature at~52℃,with laser-induced micro-stirring effectively reducing cathode bubble adhesion and suppressing hydrogen evolution.Without laser assistance,the films exhibit poor adhesion,porous structure,and thickness nonuniformity,while increasing the laser energy progressively enhances densification,achieving 3.5μm thickness uniformity.Optimal performance at 8.5μJ laser energy demonstrates an improved deposition rate compared with conventional methods,a minimum corrosion current density(1.116×10^(−6)Amm^(−2)),and a stable friction coefficient(0.143),establishing a novel laser-assisted approach for controllable DLC electrodeposition.展开更多
Ti Ni形状记忆合金是目前唯一用作生物医学材料的形状记忆合金。它的主要缺点是不具有生物活性,会对机体造成不利影响。DLC膜以其优异的生物相容性、抗腐蚀性及化学稳定性倍受关注。利用脉冲真空电弧离子镀技术镀制DLC膜改善Ti Ni合... Ti Ni形状记忆合金是目前唯一用作生物医学材料的形状记忆合金。它的主要缺点是不具有生物活性,会对机体造成不利影响。DLC膜以其优异的生物相容性、抗腐蚀性及化学稳定性倍受关注。利用脉冲真空电弧离子镀技术镀制DLC膜改善Ti Ni合金的表面性能。对DLC膜的表面形貌、显微硬度、摩擦系数、耐磨性能及耐腐蚀性能进行了测试。结果表明:用脉冲真空电弧离子镀技术制备的DLC膜膜层表面形貌较好、硬度高、摩擦系数小、耐磨及耐腐蚀性能良好。展开更多
基金supported by the National Natural Science Foundation of China(Grant Nos.52275431 and 52075227).
文摘In this study,controllable fabrication of nickel-doped diamond-like carbon(Ni-DLC)films through laser-assisted electrochemical deposition under low-voltage conditions(5 V)is achieved.After substrate polishing,picosecond laser irradiation is applied during electrodeposition to precisely control the laser energy and defocus distance during film preparation,with subsequent analysis of surface morphology,composition,and properties in correlation with growth mechanisms.Compared with conventional DLC electrodeposition,the laser-assisted technique significantly improves film quality by maintaining the deposition zone temperature at~52℃,with laser-induced micro-stirring effectively reducing cathode bubble adhesion and suppressing hydrogen evolution.Without laser assistance,the films exhibit poor adhesion,porous structure,and thickness nonuniformity,while increasing the laser energy progressively enhances densification,achieving 3.5μm thickness uniformity.Optimal performance at 8.5μJ laser energy demonstrates an improved deposition rate compared with conventional methods,a minimum corrosion current density(1.116×10^(−6)Amm^(−2)),and a stable friction coefficient(0.143),establishing a novel laser-assisted approach for controllable DLC electrodeposition.
文摘 Ti Ni形状记忆合金是目前唯一用作生物医学材料的形状记忆合金。它的主要缺点是不具有生物活性,会对机体造成不利影响。DLC膜以其优异的生物相容性、抗腐蚀性及化学稳定性倍受关注。利用脉冲真空电弧离子镀技术镀制DLC膜改善Ti Ni合金的表面性能。对DLC膜的表面形貌、显微硬度、摩擦系数、耐磨性能及耐腐蚀性能进行了测试。结果表明:用脉冲真空电弧离子镀技术制备的DLC膜膜层表面形貌较好、硬度高、摩擦系数小、耐磨及耐腐蚀性能良好。
